TiO2 thin films using organic liquid materials prepared by Hot-Wire CVD method

Thin Solid Films

Volumn 516, Issue 5, 2008, Pages 807-809

  Iida, Tamio ^a   Takamido, Yasuhiko ^a   Kunii, Takao ^a   Ogawa, Shunsuke ^a   Mizuno, Kouichi ^a   Narita, Tomoki ^a   Yoshida, Norimitsu ^a   Itoh, Takashi ^a   Nonomura, Shuichi ^a  

^a GIFU UNIVERSITY   (Japan)

Author keywords

Catalytic chemical vapor deposition; Conductivity; Optical properties; Scanning electron microscopy; Titanium oxide; X ray diffraction; X ray photoelectron spectroscopy

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CONDUCTIVE MATERIALS; ELECTRIC CONDUCTIVITY; EVAPORATION; TITANIUM DIOXIDE;

ATOMIC HYDROGEN; CATALYTIC CHEMICAL VAPOR DEPOSITION; HYDROGEN EXPOSURES; TITANIUM OXIDE;

OXIDE FILMS;

EID: 36749092742     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.06.204     Document Type: Article

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