MOCVD growth of TiO2 thin films on single crystal GaAs substrates

International Journal of Inorganic Materials

Volumn 2, Issue 2-3, 2000, Pages 255-259

  Marco De Lucas, M C ^a   Fabreguette, F ^a   Collin, S ^a   Bourgeois, S ^a  

^a UNIVERSITÉ DE BOURGOGNE   (France)

Author keywords

A. thin films; B. vapor deposition; C. electron microscopy; D. microstructure; Oxides

Indexed keywords

ARSENIC; CARBON; GALLIUM; ORGANOMETALLIC COMPOUND; OXIDE; TITANIUM DIOXIDE;

ARTICLE; CHEMICAL COMPOSITION; CRYSTALLIZATION; FILM; METHODOLOGY; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY; TEMPERATURE; X RAY DIFFRACTION; X RAY SPECTROMETRY;

EID: 0033830873     PISSN: 14666049     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1466-6049(99)00061-6     Document Type: Article

References (10)