Structural and electrical characterization of magnetron sputtered MoO 3 thin films

Journal of Physics: Conference Series

Volumn 208, Issue , 2010, Pages

  Nirupama, V ^a   Chandra Sekhar, M ^a   Subramanyam, K ^b   Uthanna, S ^a  

^a SRI VENKATESWARA UNIVERSITY   (India)

^b Savcor Group Limited   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; BINDING ENERGY; GLOW DISCHARGES; MAGNETRON SPUTTERING; MOLYBDENUM; MOLYBDENUM OXIDE; OXIDE FILMS; OXYGEN; PARTIAL PRESSURE;

ARGON GAS MIXTURES; CRYSTALLINE SILICON SUBSTRATES; DC MAGNETRON SPUTTERING; DISCHARGE CHARACTERISTICS; ELECTRICAL CHARACTERIZATION; ELECTRICAL CONDUCTIVITY; MECHANICAL AND ELECTRICAL PROPERTIES; OXYGEN PARTIAL PRESSURE;

THIN FILMS;

EID: 77950483536     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/208/1/012101     Document Type: Conference Paper

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