Investigation of nitrogen addition on hydrogen incorporation in CVD diamond films from polycrystalline to nanocrystalline

Diamond and Related Materials

Volumn 19, Issue 5-6, 2010, Pages 404-408

  Tang, C J ^a,b,c   Abe, I ^c   Vieira, L G ^d   Soares, M J ^c   Gracio J ^a   Pinto, J L ^c  

^a UNIVERSITY OF AVEIRO   (Portugal)

^b CHANGSHU INSTITUTE OF TECHNOLOGY   (China)

^c UNIVERSITY OF AVEIRO   (Portugal)

^d UNIVERSITY OF MINHO   (Portugal)

Author keywords

FTIR spectroscopy; Hydrogen impurity incorporation; Microwave plasma CVD; Nanocrystalline diamond films; Nitrogen addition; Polycrystalline diamond films

Indexed keywords

FTIR SPECTROSCOPY; HYDROGEN IMPURITY; MICROWAVE PLASMA CVD; NANOCRYSTALLINE DIAMOND FILMS; NITROGEN ADDITIONS; POLYCRYSTALLINE DIAMOND FILMS;

CHEMICAL VAPOR DEPOSITION; DIAMONDS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GASES; HYDROGEN; MICROWAVES; NANOCRYSTALLINE SILICON; NITROGEN; NITROGEN PLASMA; OXYGEN; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS;

DIAMOND FILMS;

EID: 77950459687     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2010.01.030     Document Type: Article

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