Study of SF6 and SF6/O2 plasmas in a hollow cathode reactive ion etching reactor using Langmuir probe and optical emission spectroscopy techniques

Plasma Sources Science and Technology

Volumn 19, Issue 2, 2010, Pages

  Pessoa, R S ^a   Tezani, L L ^a   MacIel, H S ^a   Petraconi, G ^a   Massi, M ^a  

^a INSTITUTO TECNOLÓGICO DE AERONÁUTICA   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FLUORINE; ELECTRON DENSITIES; GAS MIXING RATIO; GAS PRESSURES; GAS VOLUME; HOLLOW CATHODES; OPERATION CONDITIONS; OPTICAL STUDY; ORDER OF MAGNITUDE; PLASMA PARAMETER; RADIO-FREQUENCY POWER; REACTIVE ION;

CARRIER CONCENTRATION; CHEMICAL BONDS; ELECTRON DENSITY MEASUREMENT; ELECTRON TEMPERATURE; ELECTRONEGATIVITY; EMISSION SPECTROSCOPY; FLUORINE; IONS; LANGMUIR PROBES; LIGHT EMISSION; OPTICAL EMISSION SPECTROSCOPY; ORGANIC POLYMERS; PHOTORESISTS; PLASMA DIAGNOSTICS; PROBES;

REACTIVE ION ETCHING;

EID: 77950267258     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/19/2/025013     Document Type: Article

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