Parallel optical nanolithography using nanoscale bowtie aperture array

Optics Express

Volumn 18, Issue 7, 2010, Pages 7369-7375

  Uppuluri, Sreemanth M V ^a   Kinzel, Edward C ^a   Li, Yan ^a   Xu, Xianfan ^a  

^a PURDUE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LIGHT TRANSMISSION; NANOLITHOGRAPHY; PUMPING (LASER); SURFACE TREATMENT;

BOWTIE APERTURE; DIODE-PUMPED; DIRECT-WRITING; LIGHT SPOT; NANO SCALE; OPTICAL ALIGNMENT SYSTEMS; OPTICAL NANOLITHOGRAPHY; PHOTORESIST SURFACES; SUB-100 NM;

NANOSTRUCTURED MATERIALS;

ALUMINUM; NANOMATERIAL;

ALGORITHM; ARTICLE; CHEMISTRY; EQUIPMENT DESIGN; LIGHT; METHODOLOGY; NANOTECHNOLOGY; OPTICS; PHOTOCHEMISTRY; STATISTICAL MODEL;

ALGORITHMS; ALUMINUM; EQUIPMENT DESIGN; LIGHT; MODELS, STATISTICAL; NANOSTRUCTURES; NANOTECHNOLOGY; OPTICS AND PHOTONICS; PHOTOCHEMISTRY;

EID: 77950208622     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.18.007369     Document Type: Article

References (18)

1. S. Sun, and G. J. Leggett, "Matching the resolution of electron beam lithography by scanning near-field photolithography," Nano Lett. 4(8), 1381-1384 (2004).
2. M. M. Alkaisi, R. J. Blaikie, S. J. McNab, R. Cheung, and D. R. S. Cumming, "Sub-diffraction-limited patterning using evanescent near-field optical lithography," Appl. Phys. Lett. 75(22), 3560-3562 (1999).
3. Z. W. Liu, Q. H. Wei, and X. Zhang, "Surface plasmon interference nanolithography," Nano Lett. 5(5), 957-961 (2005).
4. X. Shi, and L. Hesselink, "Mechanisms for enhancing power throughput from planar nano-apertures for nearfield optical data storage," Jpn. J. Appl. Phys. 41(Part 1, No. 3B), 1632-1635 (2002).
5. K. Sendur, W. Challener, and C Peng, "Ridge waveguide as a near field aperture for high density data storage," J. Appl. Phys. 96(5), 2743-2752 (2004).
6. E. X. Jin, and X. Xu, "Finite difference time domain studies on optical transmission through planar nanoapertures in a metal film," Jpn. J. Appl. Phys. 43(1), 407-417 (2004).
7. F. Chen, A. Itagi, J. A. Bain, D. D. Stancil, T. E. Schlesinger, L. Stebounova, G. C Walker, and B. B. Akhremitchev, "Imaging of optical field confinement in ridge waveguides fabricated on very-small-aperture laser," Appl. Phys. Lett. 83(16), 3245-3247 (2003).
8. L. Wang, S. M. V. Uppuluri, E. X. Jin, and X. Xu, "Nanolithography using high transmission nanoscale bowtie apertures," Nano Lett. 6(3), 361-364 (2006).
9. N. Murphy-DuBay, L. Wang, E. C Kinzel, S. M. V. Uppuluri, and X. Xu, "Nanopatterning using NSOM probes integrated with high transmission nanoscale bowtie aperture," Opt. Express 16(4), 2584-2589 (2008).
10. Y. Kim, S. Kim, H. Jung, E. Lee, and J. W. Hahn, "Plasmonic nano lithography with a high scan speed contact probe," Opt. Express 17(22), 19476-19485 (2009).
11. W. Srituravanich, L. Pan, Y. Wang, C Sun, D. B. Bogy, and X. Zhang, "Flying plasmonic lens in the near field for high-speed nanolithography," Nat. Nanotechnol. 3(12), 733-737 (2008).
12. E. X. Jin, and X. Xu, "Obtaining super resolution light spot using surface plasmon assisted sharp ridge nanoaperture," Appl. Phys. Lett. 86(11), 111106-111108 (2005).
13. Solvay Solexis Inc, "Fomblin Lubes - PFPE lubricants", http://www.solvaysolexis.eom/static/wma/pdf/1/4/9/7/3/BR%20FOMB%20Lubes%20LD. pdf.
14. Remcom Inc., FDTD Commercial Software Package, Version XFDTD 6.3.
15. H. Gai, J. Wang, and Q. Tian, "Modified Debye model parameters of metals applicable for broadband calculations," Appl. Opt. 46(12), 2229-2233 (2007).
16. P. B. Johnson, and R. W. Christy, "Optical constants of transition metals: Ti, V, Cr, Mn, Fe, Co, Ni and Pd," Phys. Rev. B 9(12), 5056-5070 (1974).
17. E. D. Palik, Handbook of Optical Constants of Solids (Academic Press, 1985).
18. M. Despont, J. Brugger, U. Drechsler, U. Dürig, W. Haberle, M. Lutwyche, H. Rothuizen, R. Stutz, R. Widmer, G. Binnig, H. Rohrer, and P. Vettiger, "VLSI-NEMS chip for parallel AFM data storage," Sens. Actuators 80(2), 100-107 (2000).