Plasmonic nano lithography with a high scan speed contact probe

Optics Express

Volumn 17, Issue 22, 2009, Pages 19476-19485

  Kim, Yongwoo ^a   Kim, Seok ^a   Jung, Howon ^a   Lee, Eungman ^a   Hahn, Jae W ^a  

^a Yonsei University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

LITHOGRAPHY; NANOLITHOGRAPHY; PHOTOLITHOGRAPHY; PHOTORESISTS; PLASMONS; SELF ASSEMBLED MONOLAYERS;

BOTTOM SURFACES; CONTACT PROBES; EXTERNAL GAPS; GAP DISTANCE CONTROL; LINE PATTERNING; OPTICAL CONTACT; PLASMONIC LITHOGRAPHY; SCAN SPEED;

PROBES;

NANOMATERIAL;

ARTICLE; CHEMISTRY; COMPUTER AIDED DESIGN; EQUIPMENT; EQUIPMENT DESIGN; INSTRUMENTATION; NANOTECHNOLOGY; PHOTOGRAPHY; REPRODUCIBILITY; SENSITIVITY AND SPECIFICITY; SURFACE PLASMON RESONANCE; TRANSDUCER; ULTRASTRUCTURE;

COMPUTER-AIDED DESIGN; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; NANOSTRUCTURES; NANOTECHNOLOGY; PHOTOGRAPHY; REPRODUCIBILITY OF RESULTS; SENSITIVITY AND SPECIFICITY; SURFACE PLASMON RESONANCE; TRANSDUCERS;

EID: 70749146776     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.17.019476     Document Type: Article

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