SCOPUS 정보 검색 플랫폼

Journal of the Electrochemical Society

Volumn 157, Issue 4, 2010, Pages

Selective electroless copper plating on poly(ethylene terephthalate) surfaces by microcontact printing

(3) Huang, Shih Chun a Tsao, Ting Chieh a Chen, Li Jen a

a NATIONAL TAIWAN UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION LAYER; COPPER DEPOSITION; COPPER PATTERN; ELECTROLESS COPPER PLATING; MASKING LAYERS; MICRO CONTACT PRINTING; OCTADECYLTRICHLOROSILANE; SCALE PATTERN; SUBMICROMETERS;

ADHESION; CATALYSTS; COPPER PLATING; ELECTROLESS PLATING; ELECTRON DEVICE MANUFACTURE; ELECTROPLATING; ETHYLENE; FUNCTIONAL GROUPS; MONOLAYERS; NUMERICAL METHODS; POLYETHYLENE TEREPHTHALATES; PRINTING;

COPPER;

EID: 77949767566 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.3306136 Document Type: Article

Times cited : (18)

References (29)

1
- 77952190343
- 10.1021/am800121d
- D. Zabetakis and W. J. Dressick, ACS Appl. Mater. Interfaces, 1, 4 (2009). 10.1021/am800121d
- (2009) ACS Appl. Mater. Interfaces , vol.1 , pp. 4
- Zabetakis, D.¹ Dressick, W.J.²

2
- 20444458036
- 1022-1336, 10.1002/marc.200400462
- K. Cheng, M. H. Yang, W. W. W. Chiu, C. Y. Huang, J. Chang, T. F. Ying, and Y. Yang, Macromol. Rapid Commun. 1022-1336, 26, 247 (2005). 10.1002/marc.200400462
- (2005) Macromol. Rapid Commun. , vol.26 , pp. 247
- Cheng, K.¹ Yang, M.H.² Chiu, W.W.W.³ Huang, C.Y.⁴ Chang, J.⁵ Ying, T.F.⁶ Yang, Y.⁷

3
- 0003835724
- G. O. Mallory and J. B. Hajdu, Editors, American Electroplaters and Surface Finisher Society, Orlando, FL
- N. Koura, in Electroless Plating: Fundamentals and Applications, G. O. Mallory, and, J. B. Hajdu, Editors, American Electroplaters and Surface Finisher Society, Orlando, FL (1990).
- (1990) Electroless Plating: Fundamentals and Applications
- Koura, N.¹

4
- 14544281925
- 0040-6090, 10.1016/j.tsf.2004.08.180
- W. Prissanaroon, N. Brack, P. J. Pigram, P. Hale, P. Kappen, and J. Liesegang, Thin Solid Films 0040-6090, 477, 131 (2005). 10.1016/j.tsf.2004.08. 180
- (2005) Thin Solid Films , vol.477 , pp. 131
- Prissanaroon, W.¹ Brack, N.² Pigram, P.J.³ Hale, P.⁴ Kappen, P.⁵ Liesegang, J.⁶

5
- 0031095713
- 0013-4651, 10.1149/1.1837505
- V. M. Dubin and Y. Shacham-Diamand, J. Electrochem. Soc. 0013-4651, 144, 898 (1997). 10.1149/1.1837505
- (1997) J. Electrochem. Soc. , vol.144 , pp. 898
- Dubin, V.M.¹ Shacham-Diamand, Y.²

6
- 11444257246
- 0169-4332, 10.1016/j.apsusc.2004.07.051
- Y. Li, D. S. Chen, Q. H. Lu, X. F. Qian, Z. K. Zhu, and J. Yin, Appl. Surf. Sci. 0169-4332, 241, 471 (2005). 10.1016/j.apsusc.2004.07.051
- (2005) Appl. Surf. Sci. , vol.241 , pp. 471
- Li, Y.¹ Chen, D.S.² Lu, Q.H.³ Qian, X.F.⁴ Zhu, Z.K.⁵ Yin, J.⁶

7
- 0031947320
- 1433-7851, 10.1002/(SICI)1521-3773(19980316)37:5<550::AID- ANIE550>3.0.CO;2-G
- Y. Xia and G. M. Whitesides, Angew. Chem., Int. Ed. 1433-7851, 37, 550 (1998). 10.1002/(SICI)1521-3773(19980316)37:5<550::AID-ANIE550>3.0.CO;2-G
- (1998) Angew. Chem., Int. Ed. , vol.37 , pp. 550
- Xia, Y.¹ Whitesides, G.M.²

8
- 0031269461
- 0743-7463, 10.1021/la970537z
- Z. Huang, P. C. Wang, A. G. MacDiarmid, Y. Xia, and G. M. Whitesides, Langmuir 0743-7463, 13, 6480 (1997). 10.1021/la970537z
- (1997) Langmuir , vol.13 , pp. 6480
- Huang, Z.¹ Wang, P.C.² MacDiarmid, A.G.³ Xia, Y.⁴ Whitesides, G.M.⁵

9
- 77949691408
- U.S. Pat. 6,060,121
- P. W. Hidber, E. Helbig, E. Kim, and G. M. Whitesides, U.S. Pat. 6,060,121 (2000).
- (2000)
- Hidber, P.W.¹ Helbig, E.² Kim, E.³ Whitesides, G.M.⁴

10
- 0034271701
- 0743-7463, 10.1021/la0000623
- Z. P. Yang, A. M. Belu, A. Liebmann-Vinson, H. Sugg, and A. Chilkoti, Langmuir 0743-7463, 16, 7482 (2000). 10.1021/la0000623
- (2000) Langmuir , vol.16 , pp. 7482
- Yang, Z.P.¹ Belu, A.M.² Liebmann-Vinson, A.³ Sugg, H.⁴ Chilkoti, A.⁵

11
- 30344483633
- 0743-7463, 10.1021/la051538r
- S. Sawada, Y. Masuda, P. X. Zhu, and K. Koumoto, Langmuir 0743-7463, 22, 332 (2006). 10.1021/la051538r
- (2006) Langmuir , vol.22 , pp. 332
- Sawada, S.¹ Masuda, Y.² Zhu, P.X.³ Koumoto, K.⁴

12
- 2342423961
- 0743-7463, 10.1021/la036088m
- J. Xiang, P. Zhu, Y. Masuda, and K. Koumoto, Langmuir 0743-7463, 20, 3278 (2004). 10.1021/la036088m
- (2004) Langmuir , vol.20 , pp. 3278
- Xiang, J.¹ Zhu, P.² Masuda, Y.³ Koumoto, K.⁴

13
- 0032165230
- 0013-4651, 10.1149/1.1838800
- H. T. Ng, S. F. Y. Li, L. Chan, F. C. Loh, and K. L. Tan, J. Electrochem. Soc. 0013-4651, 145, 3301 (1998). 10.1149/1.1838800
- (1998) J. Electrochem. Soc. , vol.145 , pp. 3301
- Ng, H.T.¹ Li, S.F.Y.² Chan, L.³ Loh, F.C.⁴ Tan, K.L.⁵

14
- 0038717551
- 0743-7463, 10.1021/la0341658
- E. Delamarche, M. Geissler, R. H. Magnuson, H. Schmid, and B. Michel, Langmuir 0743-7463, 19, 5892 (2003). 10.1021/la0341658
- (2003) Langmuir , vol.19 , pp. 5892
- Delamarche, E.¹ Geissler, M.² Magnuson, R.H.³ Schmid, H.⁴ Michel, B.⁵

15
- 0036611646
- 1616-301X, 10.1002/1616-3028(20020618)12:6/7<432::AID-ADFM432>3.0. CO;2-1
- A. M. Bittner, X. C. Wu, and K. Kern, Adv. Funct. Mater. 1616-301X, 12, 432 (2002). 10.1002/1616-3028(20020618)12:6/7<432::AID-ADFM432>3.0.CO;2-1
- (2002) Adv. Funct. Mater. , vol.12 , pp. 432
- Bittner, A.M.¹ Wu, X.C.² Kern, K.³

16
- 21244488197
- 0947-6539, 10.1002/chem.200401138
- C. M. Bruinink, C. A. Nijhuis, M. Peter, B. Dordi, O. Crespol-Biel, T. Auletta, A. Mulder, H. Schonherr, G. J. Vancso, J. Huskens, Chemistry (Weinheim, Ger.) 0947-6539, 11, 3988 (2005). 10.1002/chem.200401138
- (2005) Chemistry (Weinheim, Ger.) , vol.11 , pp. 3988
- Bruinink, C.M.¹ Nijhuis, C.A.² Peter, M.³ Dordi, B.⁴ Crespol-Biel, O.⁵ Auletta, T.⁶ Mulder, A.⁷ Schonherr, H.⁸ Vancso, G.J.⁹ Huskens, J.¹⁰

17
- 0035126848
- 0013-4651, 10.1149/1.1344538
- H. H. Hsu, K. H. Lin, S. J. Lin, and J. W. Yeh, J. Electrochem. Soc. 0013-4651, 148, C47 (2001). 10.1149/1.1344538
- (2001) J. Electrochem. Soc. , vol.148 , pp. 47
- Hsu, H.H.¹ Lin, K.H.² Lin, S.J.³ Yeh, J.W.⁴

18
- 36148962871
- 0167-9317, 10.1016/j.mee.2007.04.142
- S. S. Yoon, D. O. Kim, S. C. Park, Y. K. Lee, H. Y. Chae, S. B. Jung, and J. D. Nam, Microelectron. Eng. 0167-9317, 85, 136 (2008). 10.1016/j.mee.2007. 04.142
- (2008) Microelectron. Eng. , vol.85 , pp. 136
- Yoon, S.S.¹ Kim, D.O.² Park, S.C.³ Lee, Y.K.⁴ Chae, H.Y.⁵ Jung, S.B.⁶ Nam, J.D.⁷

19
- 33745763735
- 0743-7463, 10.1021/la052968k
- A. A. Mewe, E. S. Kooij, and B. Poelsema, Langmuir 0743-7463, 22, 5584 (2006). 10.1021/la052968k
- (2006) Langmuir , vol.22 , pp. 5584
- Mewe, A.A.¹ Kooij, E.S.² Poelsema, B.³

20
- 36649015151
- 0743-7463, 10.1021/la7023988
- C. H. Hsu, M. C. Yeh, K. L. Lo, and L. J. Chen, Langmuir 0743-7463, 23, 12111 (2007). 10.1021/la7023988
- (2007) Langmuir , vol.23 , pp. 12111
- Hsu, C.H.¹ Yeh, M.C.² Lo, K.L.³ Chen, L.J.⁴

21
- 34547297427
- 0743-7463, 10.1021/la7007232
- T. R. Hendricks, E. E. Dams, S. T. Wensing, and I. S. Lee, Langmuir 0743-7463, 23, 7404 (2007). 10.1021/la7007232
- (2007) Langmuir , vol.23 , pp. 7404
- Hendricks, T.R.¹ Dams, E.E.² Wensing, S.T.³ Lee, I.S.⁴

22
- 0344737891
- 0897-4756, 10.1021/cm034554n
- I. S. Lee, P. T. Hammond, and M. F. Rubner, Chem. Mater. 0897-4756, 15, 4583 (2003). 10.1021/cm034554n
- (2003) Chem. Mater. , vol.15 , pp. 4583
- Lee, I.S.¹ Hammond, P.T.² Rubner, M.F.³

23
- 0037062813
- 0743-7463, 10.1021/la0200764
- X. C. Wu, A. M. Bittner, and K. Kern, Langmuir 0743-7463, 18, 4984 (2002). 10.1021/la0200764
- (2002) Langmuir , vol.18 , pp. 4984
- Wu, X.C.¹ Bittner, A.M.² Kern, K.³

24
- 0034248008
- 0743-7463, 10.1021/la991584p
- H. Kind, M. Geissler, H. Schmid, B. Michel, K. Kern, and E. Delamarche, Langmuir 0743-7463, 16, 6367 (2000). 10.1021/la991584p
- (2000) Langmuir , vol.16 , pp. 6367
- Kind, H.¹ Geissler, M.² Schmid, H.³ Michel, B.⁴ Kern, K.⁵ Delamarche, E.⁶

25
- 22444435567
- 1057-7157, 10.1109/JMEMS.2005.844746
- S. Bhattacharya, A. Datta, J. M. Berg, and S. Gangopadhyay, J. Microelectromech. Syst. 1057-7157, 14, 590 (2005). 10.1109/JMEMS.2005.844746
- (2005) J. Microelectromech. Syst. , vol.14 , pp. 590
- Bhattacharya, S.¹ Datta, A.² Berg, J.M.³ Gangopadhyay, S.⁴

26
- 53749099719
- 10.1016/j.chroma.2008.08.088
- Z. X. Hao, H. W. Chen, X. Y. Zhu, J. M. Li, and C. Liu, J. Chromatogr. A, 1209, 246 (2008). 10.1016/j.chroma.2008.08.088
- (2008) J. Chromatogr. A , vol.1209 , pp. 246
- Hao, Z.X.¹ Chen, H.W.² Zhu, X.Y.³ Li, J.M.⁴ Liu, C.⁵

27
- 0026962357
- 0013-4651, 10.1149/1.2069102
- A. M. T. van der Putten, J. G. de Bakker, and L. G. J. Fokkink, J. Electrochem. Soc. 0013-4651, 139, 3475 (1992). 10.1149/1.2069102
- (1992) J. Electrochem. Soc. , vol.139 , pp. 3475
- Van Der Putten, A.M.T.¹ De Bakker, J.G.² Fokkink, L.G.J.³

28
- 0042410591
- 0009-2614, 10.1016/S0009-2614(01)00971-X
- L. J. Chen, Y. H. Tsai, C. S. Liu, D. R. Chiou, and M. C. Yeh, Chem. Phys. Lett. 0009-2614, 346, 241 (2001). 10.1016/S0009-2614(01)00971-X
- (2001) Chem. Phys. Lett. , vol.346 , pp. 241
- Chen, L.J.¹ Tsai, Y.H.² Liu, C.S.³ Chiou, D.R.⁴ Yeh, M.C.⁵

29
- 5444271265
- 0743-7463, 10.1021/la0487040
- R. B. A. Sharpe, D. Burdinski, J. Huskens, H. J. W. Zandvliet, D. N. Reihoudt, and B. Poelsema, Langmuir 0743-7463, 20, 8646 (2004). 10.1021/la0487040
- (2004) Langmuir , vol.20 , pp. 8646
- Sharpe, R.B.A.¹ Burdinski, D.² Huskens, J.³ Zandvliet, H.J.W.⁴ Reihoudt, D.N.⁵ Poelsema, B.⁶

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.