Optimization of etching conditions for site-controlled tunnel pits with high aspect ratios in al foil

Journal of the Electrochemical Society

Volumn 157, Issue 4, 2010, Pages

  Fukushima, Tatsuro ^a   Nishio, Kazuyuki ^a   Masuda, Hideki ^a  

^a TOKYO METROPOLITAN UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AL FOIL; ANODE ETCHING; DEEP TUNNELS; ETCHING CONDITION; HIGH ASPECT RATIO;

ALUMINUM FOIL; ASPECT RATIO; DISSOLUTION; ETCHING; PHOTORESISTS; PRESSURE DROP;

WIND TUNNELS;

EID: 77949716081     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3308594     Document Type: Article

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