Mathematical model for the initiation of aluminum etch tunnels

Journal of the Electrochemical Society

Volumn 145, Issue 9, 1998, Pages 3100-3109

  Zhou, Ying ^a   Hebert, Kurt R ^a  

^a IOWA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINE COMPOUNDS; ELECTROLYTES; ETCHING; GROWTH (MATERIALS); MASS TRANSFER; MATHEMATICAL MODELS; OXIDES; PASSIVATION; RATE CONSTANTS; SOLUTIONS;

ANODIC ETCHING; OHMIC DROP;

ALUMINUM;

EID: 0032163621     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838771     Document Type: Article

References (24)