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Volumn 147, Issue 11, 2000, Pages 4111-4119
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Kinetic model for oxide film passivation in aluminum etch tunnels
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Author keywords
[No Author keywords available]
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Indexed keywords
ALUMINUM;
ASPECT RATIO;
DISSOLUTION;
ETCHING;
FILMS;
MATHEMATICAL MODELS;
OXIDES;
PITTING;
REACTION KINETICS;
SODIUM CHLORIDE;
CURRENT RAMPS;
DISSOLVING SURFACE;
ETCH TUNNELS;
OXIDE FILMS;
POTENTIAL TRANSIENTS;
PASSIVATION;
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EID: 0034323716
PISSN: 00134651
EISSN: None
Source Type: Journal
DOI: 10.1149/1.1394027 Document Type: Article |
Times cited : (14)
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References (25)
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