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Volumn 147, Issue 11, 2000, Pages 4111-4119

Kinetic model for oxide film passivation in aluminum etch tunnels

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ASPECT RATIO; DISSOLUTION; ETCHING; FILMS; MATHEMATICAL MODELS; OXIDES; PITTING; REACTION KINETICS; SODIUM CHLORIDE;

EID: 0034323716     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1394027     Document Type: Article
Times cited : (14)

References (25)
  • 3
    • 0002388707 scopus 로고
    • R. P. Frankenthal and J. Kruger, Editors, The Electrochemical Society Corrosion Monograph Series, Princeton, NJ
    • J. R. Galvele, in Passivity of Metals, R. P. Frankenthal and J. Kruger, Editors, p. 285, The Electrochemical Society Corrosion Monograph Series, Princeton, NJ (1978).
    • (1978) Passivity of Metals , pp. 285
    • Galvele, J.R.1
  • 4
    • 0003018871 scopus 로고
    • R. P. Frankenthal and J. Kruger, Editors, The Electrochemical Society Corrosion Monograph Series, Princeton, NJ
    • H. Kaesche, in Passivity of Metals, R. P. Frankenthal and J. Kruger, Editors, p. 935, The Electrochemical Society Corrosion Monograph Series, Princeton, NJ (1978).
    • (1978) Passivity of Metals , pp. 935
    • Kaesche, H.1
  • 24
    • 0342609813 scopus 로고    scopus 로고
    • M.S. Thesis, Iowa State University, Ames, IA
    • N. Sinha, M.S. Thesis, Iowa State University, Ames, IA (1999).
    • (1999)
    • Sinha, N.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.