Fabrication of site-controlled tunnel pits with high aspect ratios by electrochemical etching of Al using masking film

Electrochemical and Solid-State Letters

Volumn 10, Issue 10, 2007, Pages

  Nishio, Kazuyuki ^a,b   Fukushima, Tatsuro ^a   Takeda, Akifumi ^a   Masuda, Hideki ^a,b  

^a TOKYO METROPOLITAN UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ASPECT RATIO; ELECTROCHEMICAL ETCHING; ELECTROLYTIC CAPACITORS; MASKS;

MASKING FILM; SURFACE-ENLARGED ELECTRODE; TUNNEL PITS;

ELECTRON TUNNELING;

EID: 34547837509     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2767531     Document Type: Article

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