-
1
-
-
57949087144
-
-
1932-7447
-
P. V. Kamat, J. Phys. Chem. C 1932-7447, 112, 18737 (2008).
-
(2008)
J. Phys. Chem. C
, vol.112
, pp. 18737
-
-
Kamat, P.V.1
-
2
-
-
49749097889
-
-
0022-0248, 10.1016/j.jcrysgro.2008.07.029
-
D. Choi, Y. Ge, J. S. Harris, J. Cagnon, and S. Stemmer, J. Cryst. Growth 0022-0248, 310, 4273 (2008). 10.1016/j.jcrysgro.2008.07.029
-
(2008)
J. Cryst. Growth
, vol.310
, pp. 4273
-
-
Choi, D.1
Ge, Y.2
Harris, J.S.3
Cagnon, J.4
Stemmer, S.5
-
3
-
-
40849135985
-
-
0040-6090, 10.1016/j.tsf.2008.01.003
-
M. I. Alonso, M. Garriga, A. Bernardi, A. R. Goni, A. F. Lopeandia, G. Garcia, J. Rodriguez Viejo, and J. L. Labar, Thin Solid Films 0040-6090, 516, 4277 (2008). 10.1016/j.tsf.2008.01.003
-
(2008)
Thin Solid Films
, vol.516
, pp. 4277
-
-
Alonso, M.I.1
Garriga, M.2
Bernardi, A.3
Goni, A.R.4
Lopeandia, A.F.5
Garcia, G.6
Rodriguez Viejo, J.7
Labar, J.L.8
-
4
-
-
0038048936
-
-
0003-6951, 10.1063/1.1573332
-
Q. Wan, C. L. Lin, N. L. Zhang, W. L. Liu, G. Yang, and T. H. Wang, Appl. Phys. Lett. 0003-6951, 82, 3162 (2003). 10.1063/1.1573332
-
(2003)
Appl. Phys. Lett.
, vol.82
, pp. 3162
-
-
Wan, Q.1
Lin, C.L.2
Zhang, N.L.3
Liu, W.L.4
Yang, G.5
Wang, T.H.6
-
5
-
-
0035334053
-
-
0168-583X, 10.1016/S0168-583X(01)00497-9
-
C. Bonafos, B. Colombeau, A. Altibelli, M. Carrada, G. Ben Assayag, and B. Garrido, Nucl. Instrum. Methods Phys. Res. B 0168-583X, 178, 17 (2001). 10.1016/S0168-583X(01)00497-9
-
(2001)
Nucl. Instrum. Methods Phys. Res. B
, vol.178
, pp. 17
-
-
Bonafos, C.1
Colombeau, B.2
Altibelli, A.3
Carrada, M.4
Ben Assayag, G.5
Garrido, B.6
-
6
-
-
36449004565
-
-
0003-6951, () 10.1063/1.106412;, Thin Solid Films 0040-6090, 380, 176 (2000) 10.1016/S0040-6090(00)01497-8;, Thin Solid Films 0040-6090, 517, 272 (2008). 10.1016/j.tsf.2008.08.018
-
S. K. Fukatsu, H. Fujita, Y. Yaguchi, Y. Shiraki, and R. Ito, Appl. Phys. Lett. 0003-6951, 59, 2103 (1991) 10.1063/1.106412; O. Leifeld, E. Müller, D. Grutzmacher, and K. Kern, Thin Solid Films 0040-6090, 380, 176 (2000) 10.1016/S0040-6090(00)01497-8; T. F. Wietler, E. Bugiel, and K. R. Hofmann, Thin Solid Films 0040-6090, 517, 272 (2008). 10.1016/j.tsf.2008.08.018
-
(1991)
Appl. Phys. Lett.
, vol.59
, pp. 2103
-
-
Fukatsu, S.K.1
Fujita, H.2
Yaguchi, Y.3
Shiraki, Y.4
Ito, R.5
Leifeld, O.6
Müller, E.7
Grutzmacher, D.8
Kern, K.9
Wietler, T.F.10
Bugiel, E.11
Hofmann, K.R.12
-
7
-
-
0032065070
-
-
0022-3093, 10.1016/S0022-3093(98)00241-5
-
M. Zacharias and P. M. Fauchet, J. Non-Cryst. Solids 0022-3093, 227-230, 1058 (1998). 10.1016/S0022-3093(98)00241-5
-
(1998)
J. Non-Cryst. Solids
, vol.227-230
, pp. 1058
-
-
Zacharias, M.1
Fauchet, P.M.2
-
8
-
-
0000988761
-
-
0084-6600, 10.1146/annurev.ms.15.080185.001213
-
G. F. Fulop and R. M. Taylor, Annu. Rev. Mater. Sci. 0084-6600, 15, 197 (1985). 10.1146/annurev.ms.15.080185.001213
-
(1985)
Annu. Rev. Mater. Sci.
, vol.15
, pp. 197
-
-
Fulop, G.F.1
Taylor, R.M.2
-
9
-
-
84921027769
-
-
0013-4651, () 10.1149/1.2778214;, J. Electrochem. Soc. 0013-4651, 124, 1505 (1977) 10.1149/1.2133101;, Electrochim. Acta 0013-4686, 25, 697 (1980). 10.1016/0013-4686(80)87081-2
-
G. Szekely, J. Electrochem. Soc. 0013-4651, 98, 318 (1951) 10.1149/1.2778214; W. Paatsch, J. Electrochem. Soc. 0013-4651, 124, 1505 (1977) 10.1149/1.2133101; N. Brinda-Konopik and G. Schade, Electrochim. Acta 0013-4686, 25, 697 (1980). 10.1016/0013-4686(80)87081-2
-
(1951)
J. Electrochem. Soc.
, vol.98
, pp. 318
-
-
Szekely, G.1
Paatsch, W.2
Brinda-Konopik, N.3
Schade, G.4
-
11
-
-
0034833969
-
-
1463-9076, 10.1039/b102232f
-
F. Endres, Phys. Chem. Chem. Phys. 1463-9076, 3, 3165 (2001). 10.1039/b102232f
-
(2001)
Phys. Chem. Chem. Phys.
, vol.3
, pp. 3165
-
-
Endres, F.1
-
12
-
-
0141562069
-
-
0009-2614, 10.1016/S0009-2614(03)01098-4
-
I. Mukhopadhyay and W. Freyland, Chem. Phys. Lett. 0009-2614, 377, 223 (2003). 10.1016/S0009-2614(03)01098-4
-
(2003)
Chem. Phys. Lett.
, vol.377
, pp. 223
-
-
Mukhopadhyay, I.1
Freyland, W.2
-
13
-
-
34548502643
-
-
1099-0062, 10.1149/1.2771097
-
Q. Huang, S. W. Bedell, K. L. Saenger, M. Copel, H. Deligianni, and L. T. Romankiw, Electrochem. Solid-State Lett. 1099-0062, 10, D124 (2007). 10.1149/1.2771097
-
(2007)
Electrochem. Solid-State Lett.
, vol.10
, pp. 124
-
-
Huang, Q.1
Bedell, S.W.2
Saenger, K.L.3
Copel, M.4
Deligianni, H.5
Romankiw, L.T.6
-
14
-
-
34548479683
-
-
1099-0062, 10.1149/1.2771086
-
Q. Huang, H. Deligianni, and L. T. Romankiw, Electrochem. Solid-State Lett. 1099-0062, 10, D121 (2007). 10.1149/1.2771086
-
(2007)
Electrochem. Solid-State Lett.
, vol.10
, pp. 121
-
-
Huang, Q.1
Deligianni, H.2
Romankiw, L.T.3
-
15
-
-
0036841918
-
-
0921-5107, 10.1016/S0921-5107(02)00297-0
-
R. B. Taylor, A. G. Fox, J. L. Hope-Weeks, R. S. Maxwell, S. M. Kauzlarich, and W. H. Lee, Mater. Sci. Eng., B 0921-5107, B96, 90 (2002). 10.1016/S0921-5107(02)00297-0
-
(2002)
Mater. Sci. Eng., B
, vol.96
, pp. 90
-
-
Taylor, R.B.1
Fox, A.G.2
Hope-Weeks, J.L.3
Maxwell, R.S.4
Kauzlarich, S.M.5
Lee, W.H.6
-
16
-
-
17844390436
-
-
0022-4596, 10.1016/j.jssc.2004.12.040
-
P. F. McMillan, J. Gryko, C. Bull, R. Arledge, A. J. Kenyon, and B. A. Cressey, J. Solid State Chem. 0022-4596, 178, 937 (2005). 10.1016/j.jssc.2004. 12.040
-
(2005)
J. Solid State Chem.
, vol.178
, pp. 937
-
-
McMillan, P.F.1
Gryko, J.2
Bull, C.3
Arledge, R.4
Kenyon, A.J.5
Cressey, B.A.6
-
17
-
-
50249143557
-
-
0935-9648, 10.1002/adma.200701751
-
G. S. Armatas and M. G. Kanatzidis, Adv. Mater. 0935-9648, 20, 546 (2008). 10.1002/adma.200701751
-
(2008)
Adv. Mater.
, vol.20
, pp. 546
-
-
Armatas, G.S.1
Kanatzidis, M.G.2
-
18
-
-
33745613264
-
-
0028-0836, 10.1038/nature04891
-
D. Sun, A. E. Riley, A. J. Cadby, E. K. Richman, S. D. Korlann, and S. H. Tolbert, Nature (London) 0028-0836, 441, 1126 (2006). 10.1038/nature04891
-
(2006)
Nature (London)
, vol.441
, pp. 1126
-
-
Sun, D.1
Riley, A.E.2
Cadby, A.J.3
Richman, E.K.4
Korlann, S.D.5
Tolbert, S.H.6
-
19
-
-
29544439746
-
-
1433-7851, 10.1002/anie.200501361
-
A. E. Riley, S. D. Korlann, E. K. Richman, and S. H. Tolbert, Angew. Chem., Int. Ed. 1433-7851, 45, 235 (2006). 10.1002/anie.200501361
-
(2006)
Angew. Chem., Int. Ed.
, vol.45
, pp. 235
-
-
Riley, A.E.1
Korlann, S.D.2
Richman, E.K.3
Tolbert, S.H.4
-
20
-
-
33746326679
-
-
0013-4651, () 10.1149/1.2131279;, Electrodeposition and Surface Treatment, 2, 1 (1973). 10.1016/0300-9416(73)90002-3
-
T. H. Teherani, W. J. Peer, J. J. Lagowski, and A. J. Bard, J. Electrochem. Soc. 0013-4651, 125, 1717 (1978) 10.1149/1.2131279; E. W. Brooman, Electrodeposition and Surface Treatment, 2, 1 (1973). 10.1016/0300-9416(73) 90002-3
-
(1978)
J. Electrochem. Soc.
, vol.125
, pp. 1717
-
-
Teherani, T.H.1
Peer, W.J.2
Lagowski, J.J.3
Bard, A.J.4
Brooman, E.W.5
-
21
-
-
0242582483
-
-
0002-7863, 10.1021/ja037007b
-
A. Ugrinov and S. C. Sevov, J. Am. Chem. Soc. 0002-7863, 125, 14059 (2003). 10.1021/ja037007b
-
(2003)
J. Am. Chem. Soc.
, vol.125
, pp. 14059
-
-
Ugrinov, A.1
Sevov, S.C.2
-
23
-
-
0036409359
-
-
0257-8972, 10.1016/S0257-8972(02)00576-5
-
M. Saitou, K. Sakae, and W. Oshikawa, Surf. Coat. Technol. 0257-8972, 162, 101 (2003). 10.1016/S0257-8972(02)00576-5
-
(2003)
Surf. Coat. Technol.
, vol.162
, pp. 101
-
-
Saitou, M.1
Sakae, K.2
Oshikawa, W.3
-
24
-
-
0031170519
-
-
0009-2665, 10.1021/cr9600722
-
F. Liu, F. Wu, and M. G. Lagally, Chem. Rev. (Washington, D.C.) 0009-2665, 97, 1045 (1997). 10.1021/cr9600722
-
(1997)
Chem. Rev. (Washington, D.C.)
, vol.97
, pp. 1045
-
-
Liu, F.1
Wu, F.2
Lagally, M.G.3
-
25
-
-
2842563831
-
-
1434-1948, 10.1002/(SICI)1099-0682(199810)1998:10<1433::AID- EJIC1433>3.0.CO;2-0
-
T. F. Fässler, H. -J. Muhr, and M. Hunziker, Eur. J. Inorg. Chem. 1434-1948, 1998, 1433. 10.1002/(SICI)1099-0682(199810)1998:10<1433::AID- EJIC1433>3.0.CO;2-0
-
Eur. J. Inorg. Chem.
, vol.1998
, pp. 1433
-
-
Fässler, T.F.1
Muhr, H.-J.2
Hunziker, M.3
|