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Volumn 312, Issue 8, 2010, Pages 1364-1369
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In situ reflectance monitoring for the MOVPE of strain-balanced InGaAs/GaAsP quantum-wells
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Author keywords
A1. Surface structure; A3. Metalorganic vapor phase epitaxy; B1. Gallium arsenic; B2. Semiconducting III V materials
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Indexed keywords
A3. METALORGANIC VAPOR PHASE EPITAXY;
B1. GALLIUM ARSENIC;
METAL-ORGANIC VAPOR PHASE EPITAXY;
SEMI CONDUCTING III-V MATERIALS;
ANISOTROPY;
ARSENIC;
CRYSTAL GROWTH;
GALLIUM ALLOYS;
ORGANOMETALLICS;
REFLECTION;
SEMICONDUCTOR GROWTH;
SEMICONDUCTOR QUANTUM WELLS;
SURFACE STRUCTURE;
VAPORS;
WELLS;
METALLORGANIC VAPOR PHASE EPITAXY;
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EID: 77949576565
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2009.11.063 Document Type: Article |
Times cited : (28)
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References (15)
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