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Volumn 312, Issue 8, 2010, Pages 1364-1369

In situ reflectance monitoring for the MOVPE of strain-balanced InGaAs/GaAsP quantum-wells

Author keywords

A1. Surface structure; A3. Metalorganic vapor phase epitaxy; B1. Gallium arsenic; B2. Semiconducting III V materials

Indexed keywords

A3. METALORGANIC VAPOR PHASE EPITAXY; B1. GALLIUM ARSENIC; METAL-ORGANIC VAPOR PHASE EPITAXY; SEMI CONDUCTING III-V MATERIALS;

EID: 77949576565     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2009.11.063     Document Type: Article
Times cited : (28)

References (15)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.