Characterization of nanostructured VO2 thin films grown by magnetron controlled sputtering deposition and post annealing method

Optics Express

Volumn 17, Issue 26, 2009, Pages 24153-24161

  Ghen, Sihai ^a   Lai, Jianjun ^a   Dai, Jun ^a   Ma, Hong ^a   Wang, Hongchen ^a   Yi, Xinjian ^a  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTALLITES; MAGNETRONS; OPTICAL SWITCHES; SCANNING ELECTRON MICROSCOPY; THIN FILM DEVICES; THIN FILMS;

AVERAGE GRAIN DIAMETER; HIGH TEMPERATURE COEFFICIENT; HIGH-SENSITIVITY DETECTORS; MONOCLINIC PHASE; NANO-STRUCTURED; POST ANNEALING; SPUTTERING DEPOSITION; SPUTTERING SYSTEMS; SWITCHING TIME; TEST RESULTS; TESTING RESULTS;

DEPOSITION;

NANOMATERIAL; VANADIUM DERIVATIVE; VANADIUM PENTOXIDE;

ARTICLE; CHEMISTRY; CRYSTALLIZATION; ELECTROMAGNETIC FIELD; ELECTROPLATING INDUSTRY; HEAT; LIGHT; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; RADIATION EXPOSURE; RADIATION SCATTERING; REFRACTOMETRY; ULTRASTRUCTURE;

CRYSTALLIZATION; ELECTROMAGNETIC FIELDS; ELECTROPLATING; HOT TEMPERATURE; LIGHT; MATERIALS TESTING; NANOSTRUCTURES; NANOTECHNOLOGY; REFRACTOMETRY; SCATTERING, RADIATION; VANADIUM COMPOUNDS;

EID: 77949510091     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.17.024153     Document Type: Article

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