Comparative study of copper surface treatment with self-assembled monolayers of aliphatic thiol, dithiol and dithiocarboxylic acid

Journal of Electroanalytical Chemistry

Volumn 637, Issue 1-2, 2009, Pages 43-49

  Denayer, J ^a,b   Delhalle, J ^a   Mekhalif, Z ^a,b  

^a UNIVERSITY OF NAMUR   (Belgium)

^b Fonds Pour la Formation À la Recherche dans l'Industrie et dans l'Agriculture   (Belgium)

Author keywords

2 Monoalkylpropane 1,3 dithiol; Alkanethiol; Copper; Dithiocarboxylic acid; Self assembled monolayers

Indexed keywords

ACIDS; CONTACT ANGLE; COPPER; CORROSION RESISTANCE; DESORPTION; PROTECTIVE COATINGS; RAPID SOLIDIFICATION; SELF ASSEMBLY; STRIPPING (REMOVAL); SUBSTRATES; SURFACE TREATMENT;

ALIPHATIC THIOLS; ALKANETHIOL; ALKANETHIOLS; CATHODIC DESORPTION; COMPARATIVE STUDIES; CONTACT ANGLE GONIOMETRY; COPPER SURFACE; DITHIOCARBOXYLIC ACIDS; DITHIOLS; ELECTROCHEMICAL STUDIES; LITHOGRAPHIC PATTERNING; METALLIC SUBSTRATE; MOLECULAR ORGANIZATION; ORGANOTHIOLS; OTHER APPLICATIONS; PM-IRRAS; POLYCRYSTALLINE COPPER; SAMS; STABLE FILMS; XPS;

SELF ASSEMBLED MONOLAYERS;

EID: 77949280650     PISSN: 15726657     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jelechem.2009.09.028     Document Type: Article

References (37)

1. Ulman A. An Introduction to Ultrathin Organic Films from Langmuir-Blodgett to Self-Assembly (1991), Academic Press, NY
2. Love J.C., Estroff L.A., Kriebel J.K., Nuzzo R.G., and Whitesides G.M. Chem. Rev. 105 (2005) 1103-1169
3. Vericat C., Vela M.E., Benitez G.A., Martin Gago J.A., Torrelles X., and Salvarezza R.C. J. Phys.: Condens. Matter. 18 (2006) 867-900
4. Jennings G.K., and Laibinis P.E. Colloids Surf. A 116 (1996) 105-114
5. Jennigs G.K., Munro J.C., Yong T.H., and Laibinis P.E. Langmuir 14 (1998) 6130-6139
6. Zamborini F.P., and Crooks R.M. Langmuir 14 (1998) 3279-3286
7. Metikos-Hukovic M., Babic R., Petrovic Z., and Posavec D. J. Electrochem. Soc. 154 (2007) C138-C143
8. Green J.B., Mc Dermott M.T., and Porter M.D. J. Phys. Chem. 99 (1995) 10960-10965
9. Friedel S., Aizenberg J., Abad S., and Wiltzius P. Appl. Phys. Lett. 77 (2000) 2406-2408
10. Kumar A., and Whitesides G.M. Science 263 (1994) 60-62
11. Xia Y., Zhao X.M., and Whitesides G.M. Microelectron. Eng. 32 (1996) 255-268
12. Huang Z., Wang P.C., MacDiarmid A.G., Xia Y., and Whitesides G.M. Langmuir 13 (1997) 6480-6484
13. Ulman A. Chem. Rev. 96 (1996) 1533-1554
14. Jones D.A. Principles and Prevention of Corrosion. second ed. (1996), Prentice Hall Upper Saddle River, NJ
15. Li J., Mayer J.W., and Colgan E.G. J. Appl. Phys. 70 (1990) 2820-2827
16. Laibinis P.E., and Whitesides G.M. J. Am. Chem. Soc. 114 (1992) 9022-9028
17. Yamamoto Y., Nishihara H., and Aramaki K. J. Electrochem. Soc. 140 (1993) 436-443
18. Laibinis P.E., Whitesides G.M., Allara D.L., Tao Y.T., Parikh A.N., and Nuzzo R.G. J. Am. Chem. Soc. 113 (1991) 7152-7167
19. Mekhalif Z., Sinapi F., Laffineur F., and Delhalle J. J. Electron Spectrosc. Relat. Phenom. 121 (2001) 149-161
20. Mekhalif Z., Fonder G., Laffineur F., and Delhalle J. J. Electroanal. Chem. 621 (2008) 245-253
21. Mekhalif Z., Fonder G., Auguste D., Laffineur F., and Delhalle J. J. Electroanal. Chem. 618 (2008) 24-32
22. Fonder G., Laffineur F., Delhalle J., and Mekhalif Z. J. Colloid Interface Sci. 326 (2008) 333-338
23. Lee T.C., Hounihan D.J., Colorado R., Park J.S., and Lee T.R. J. Phys. Chem. B 108 (2004) 2648-2653
24. T.R Lee, R. Colorado, WO 02/071151.
25. Shon Y.S., and Lee T.R. J. Phys. Chem. B 104 (2000) 8192-8200
26. Shon Y.S., Colorado R., Williams C.T., Bain C.D., and Lee T.R. Langmuir 16 (2000) 541-548
27. Volante R.P. Tetrahedron Lett. 22 (1981) 3119-3122
28. Kiankarimi M., Lowe R., McCarthy J.R., and Whitten J.P. Tetrahedron Lett. 40 (1999) 4497-4500
29. Tunoori A.R., Dutta D., and Georg G.I. Tetrahedron Lett. 39 (1998) 8751-8754
30. Colorado R., Villazana R.J., and Lee T.R. Langmuir 14 (1998) 6337-6340
31. Scherer J., Vogt M.R., Magnussen O.M., and Behm R.J. Langmuir 13 (1997) 7045-7051
32. Azzaroni O., Vela M.E., Fonticelli M., Benítez G., Carro P., Blum B., and Salvarezza R.C. J. Phys. Chem. B 107 (2003) 13446-13454
33. Porter M.D., Bright T.B., Allara D.L., and Chidsey C.E.D. J. Am. Chem. Soc. 109 (1987) 3559-3568
34. Ron H., Cohen H., Maltis S., Rappaport M., and Rubinstein I. J. Phys. Chem. B 102 (1998) 9861-9869
35. Tsao M.-W., Hoffmann C.L., Rabolt J.F., Johnson H.E., Garner D.G., Erdelen C., and Ringsdorf H. Langmuir 13 (1997) 4317-4322
36. Bain C.D., Troughton E.B., Tao Y.T., Evall J., Whitesides G.M., and Nuzzo R.G. J. Am. Chem. Soc. 111 (1989) 321-335
37. Shon Y.S., and Lee T.R. Langmuir 15 (1999) 1136-1140