Alkanethiol-oxidized copper interface: The critical influence of concentration

Journal of Colloid and Interface Science

Volumn 326, Issue 2, 2008, Pages 333-338

  Fonder, G ^a   Laffineur, F ^a   Delhalle, J ^a   Mekhalif, Z ^a  

^a UNIVERSITY OF NAMUR   (Belgium)

Author keywords

Copper; Oxide reduction; SAM; Thiol

Indexed keywords

CONCENTRATION (PROCESS); COPPER;

ALKANE THIOLS; COPPER INTERFACE; DODECANETHIOL; OXIDE REDUCTION; SAM; THIOL;

SELF ASSEMBLED MONOLAYERS;

ALKANE; ALKANETHIOL; COPPER; N DODECANETHIOL; THIOL; THIOL DERIVATIVE; UNCLASSIFIED DRUG;

ARTICLE; DESORPTION; ELECTROCHEMISTRY; OXIDATION KINETICS; OXIDATION REDUCTION REACTION; POLARIZATION MODULATION INFRARED REFLECTION ADSORPTION SPECTROSCOPY; POTENTIOMETRY; PRIORITY JOURNAL; SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 50649100133     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcis.2008.06.038     Document Type: Article

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