The synthesis of diamond films on adamantane-coated Si substrate at low temperature

Chemical Engineering Journal

Volumn 158, Issue 3, 2010, Pages 641-645

  Tiwari, Rajanish N ^a   Tiwari, Jitendra N ^a   Chang, Li ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

Adamantane; Diamond; MPCVD

Indexed keywords

ADAMANTANE; ADAMANTANES; CRYSTALLINITIES; DIAMOND DEPOSITION; DIAMOND NUCLEATION; GASEOUS MIXTURE; HIGH-RATE GROWTH; HYDROGEN GAS; LOW TEMPERATURES; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITIONS; RAMAN SPECTROMETRIES; SI SUBSTRATES; SI(1 0 0); SUBSTRATE TEMPERATURE;

DIAMOND CUTTING TOOLS; DIAMOND DEPOSITS; DIAMONDS; EPITAXIAL GROWTH; METHANE; MICROWAVES; PLASMA DEPOSITION; SCANNING ELECTRON MICROSCOPY; SILICON; SILICON CARBIDE; SYNTHESIS (CHEMICAL); X RAY PHOTOELECTRON SPECTROSCOPY;

DIAMOND FILMS;

EID: 77649337280     PISSN: 13858947     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cej.2010.01.024     Document Type: Article

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