X-ray photoelectron diffraction of the silicon-diamond interface

Physica Status Solidi (A) Applied Research

Volumn 153, Issue 2, 1996, Pages 415-429

  Maillard Schaller, E ^a   Kuettel, O M ^a   Schlapbach, L ^a  

^a UNIVERSITY OF FRIBOURG   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; CRYSTAL ORIENTATION; SEMICONDUCTING DIAMONDS; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON; SURFACES; X RAY DIFFRACTION;

SILICON DIAMOND INTERFACE; SINGLE SCATTERING CLUSTER; X RAY PHOTOELECTRON DIFFRACTION;

INTERFACES (MATERIALS);

EID: 0030079119     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/pssa.2211530216     Document Type: Article

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