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Volumn 20, Issue 11, 2010, Pages 2157-2169

The combinatorial atmospheric pressure chemical vapour deposition (cAPCVD) of a gradating N-doped mixed phase titania thin film

Author keywords

[No Author keywords available]

Indexed keywords

ANALYSIS METHOD; ATOMIC RATIO; CHEMICAL VAPOUR DEPOSITION; DIGITAL IMAGE; ELECTRICAL CONDUCTIVITY; ELECTRICAL RESISTIVITY; FUNCTIONAL PROPERTIES; HIGH-THROUGHPUT; MAPPING ANALYSIS; MAPPING TOOLS; MIXED PHASE; N-DOPED; NITROGEN CONTENT; NITROGEN DOPANT; PHASE SPACES; PHOTOCATALYTIC ACTIVITIES; RAPID METHOD; SEM; SUBSTITUTIONAL NITROGEN; SYSTEMATIC INVESTIGATIONS; TITANIA THIN FILMS; TWO-POINT; UV-A LIGHT; UV-VISIBLE; WAVELENGTH DISPERSIVE X-RAYS;

EID: 77649218256     PISSN: 09599428     EISSN: 13645501     Source Type: Journal    
DOI: 10.1039/b914117k     Document Type: Article
Times cited : (47)

References (59)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.