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Volumn 20, Issue 11, 2010, Pages 2157-2169
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The combinatorial atmospheric pressure chemical vapour deposition (cAPCVD) of a gradating N-doped mixed phase titania thin film
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Author keywords
[No Author keywords available]
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Indexed keywords
ANALYSIS METHOD;
ATOMIC RATIO;
CHEMICAL VAPOUR DEPOSITION;
DIGITAL IMAGE;
ELECTRICAL CONDUCTIVITY;
ELECTRICAL RESISTIVITY;
FUNCTIONAL PROPERTIES;
HIGH-THROUGHPUT;
MAPPING ANALYSIS;
MAPPING TOOLS;
MIXED PHASE;
N-DOPED;
NITROGEN CONTENT;
NITROGEN DOPANT;
PHASE SPACES;
PHOTOCATALYTIC ACTIVITIES;
RAPID METHOD;
SEM;
SUBSTITUTIONAL NITROGEN;
SYSTEMATIC INVESTIGATIONS;
TITANIA THIN FILMS;
TWO-POINT;
UV-A LIGHT;
UV-VISIBLE;
WAVELENGTH DISPERSIVE X-RAYS;
ATMOSPHERIC CHEMISTRY;
ATMOSPHERIC PRESSURE;
CHEMICAL ANALYSIS;
CHEMICAL VAPOR DEPOSITION;
DEPOSITION;
DOPING (ADDITIVES);
ELECTRIC CONDUCTIVITY;
LIGHT;
MAPPING;
NITROGEN;
OXIDE MINERALS;
PHASE SPACE METHODS;
PHOTOCATALYSIS;
SCANNING ELECTRON MICROSCOPY;
TITANIUM DIOXIDE;
WAVELENGTH DISPERSIVE SPECTROSCOPY;
X RAY ANALYSIS;
X RAY DIFFRACTION;
X RAY PHOTOELECTRON SPECTROSCOPY;
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EID: 77649218256
PISSN: 09599428
EISSN: 13645501
Source Type: Journal
DOI: 10.1039/b914117k Document Type: Article |
Times cited : (47)
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References (59)
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