A combinatorial approach to phase synthesis and characterisation in atmospheric pressure chemical vapour deposition

Surface and Coatings Technology

Volumn 201, Issue 22-23 SPEC. ISS., 2007, Pages 8966-8970

  Hyett, Geoffrey ^a   Parkin, Ivan P ^a  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

Author keywords

Chemical vapour deposition; Combinatorial; Thin film; Titanium dioxide; Tungsten oxide; X ray diffraction

Indexed keywords

CHARACTERIZATION; SYNTHESIS (CHEMICAL); THIN FILMS; TITANIUM DIOXIDE; TUNGSTEN COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

ATMOSPHERIC PRESSURE CHEMCIAL VAPOUR DEPOSITION; COMBINATORIAL SYNTHESIS; PHASE SYNTHESIS; TUNGSTEN OXIDE;

CHEMICAL VAPOR DEPOSITION;

CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION; SYNTHESIS (CHEMICAL); THIN FILMS; TITANIUM DIOXIDE; TUNGSTEN COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

EID: 34547680464     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.04.058     Document Type: Article

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