메뉴 건너뛰기




Volumn 493, Issue 1-2, 2010, Pages 227-232

The thickness effect on the electrical conduction mechanism in titanium oxide thin films

Author keywords

Electrical properties; Grain boundary; Thickness; TiO2; Variable range hopping (VRH) conduction

Indexed keywords

CHARACTERISTIC PARAMETER; DENSITY OF STATE; DEPOSITION PROCESS; ELECTRICAL CONDUCTION; ELECTRICAL CONDUCTION MECHANISMS; ELECTRICAL CONDUCTIVITY; ELECTRICAL PROPERTIES; ELECTRICAL PROPERTY; FILMS THICKNESS; GLASS SUBSTRATES; GRAIN BARRIER; HIGH TEMPERATURE; HOPPING DISTANCES; HOPPING ENERGIES; LOW TEMPERATURES; LOW-TEMPERATURE CONDUCTIVITY; NANOSTRUCTURED TIO; POTENTIAL BARRIERS; REACTIVE GAS; SURFACE TRAP DENSITY; TEMPERATURE DEPENDENCE; TEMPERATURE RANGE; THICKNESS EFFECT; TIO; TITANIUM OXIDE THIN FILMS; VARIABLE-RANGE HOPPING; VARIABLE-RANGE HOPPING CONDUCTION;

EID: 77249114091     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2009.12.061     Document Type: Article
Times cited : (40)

References (25)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.