Self-masking controlled by metallic seed layer during glass dry-etching for optically scattering surfaces

Journal of Applied Physics

Volumn 107, Issue 3, 2010, Pages

  Hein, E ^a   Fox, D ^a   Fouckhardt, H ^a  

^a University of Koblenz Landau   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ETCH PARAMETERS; ETCH PROCESS; GLASS SURFACES; HIGH DENSITY; NON-VOLATILE; OPTICAL SCATTERING; REPRODUCIBILITIES; SCATTERING CHAR-ACTERISTICS; SCATTERING SURFACE; SEED LAYER; SELF-MASKING; SURFACE FUNCTIONALITIES; THIN METALLIC LAYER;

BOROSILICATE GLASS; DRY ETCHING; FUSED SILICA; HALOGEN COMPOUNDS; METALLIC GLASS; SCATTERING; SILICA; SURFACE ROUGHNESS;

REACTIVE ION ETCHING;

EID: 76949108493     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3290969     Document Type: Article

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