Reactive ion etching of piezoelectric materials in CF4/CHF3 plasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 4, 1998, Pages 2037-2041

  Leech, Patrick W ^a  

^a CSIRO   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032331538     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581307     Document Type: Article

References (13)

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