SCOPUS 정보 검색 플랫폼

Microelectronic Engineering

Volumn 87, Issue 5-8, 2010, Pages 1226-1228

Double layer resist process scheme for metal lift-off with application in inductive heating of microstructures

(5) Ouattara, L a Knutzen, M a Keller, S a Hansen, M F a Boisen, A a

a TECHNICAL UNIVERSITY OF DENMARK (Denmark)

Author keywords

Double layer LOR positive photoresist lift off; Metallization of high aspect ratio structures; SU 8 microfabrication

Indexed keywords

DOUBLE LAYER LOR/POSITIVE PHOTORESIST LIFT-OFF; DOUBLE LAYERS; HIGH ASPECT RATIO STRUCTURES; METALLIZATION OF HIGH-ASPECT-RATIO STRUCTURES; METALLIZATIONS;

CHROMIUM; ELECTRODES; HEATING; INDUCTION HEATING; METALLIZING; METALS; MICROANALYSIS; MICROFABRICATION; MICROMACHINING; MICROSTRUCTURE; PHOTORESISTORS; PHOTORESISTS; SURFACE TREATMENT;

ASPECT RATIO;

EID: 76949099710 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/j.mee.2009.11.147 Document Type: Article

Times cited : (12)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.