Fabrication of nano-scaled patterns on ceramic thin films and silicon substrates by soft ultraviolet nanoimprint lithography

Microelectronic Engineering

Volumn 87, Issue 5-8, 2010, Pages 959-962

  Jim, K L ^a   Lee, F K ^a   Xin, J Z ^a   Leung, C W ^a   Chan, H L W ^a   Chen, Y ^a,b  

^a HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

^b ECOLE NORMALE SUPÉRIEURE   (France)

Author keywords

Ferroelectric materials; Nanoimprint lithography; Photonic crystals

Indexed keywords

CERAMIC FILM; CERAMIC THIN FILMS; GENERIC PROCESS; MASTER MOLDS; PILLAR ARRAYS; SILICON SUBSTRATES; SUBMICRON; TIO; ULTRAVIOLET-NANOIMPRINT LITHOGRAPHY;

BARIUM; CERAMIC MATERIALS; FERROELECTRIC DEVICES; FERROELECTRIC MATERIALS; FERROELECTRICITY; INDUCTIVELY COUPLED PLASMA; MOLDS; PHOTONIC CRYSTALS; PLASMA ETCHING; SEMICONDUCTING SILICON COMPOUNDS;

NANOIMPRINT LITHOGRAPHY;

EID: 76949092273     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2009.11.141     Document Type: Article

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