Nanoholes by soft UV nanoimprint lithography applied to study of membrane proteins

Microelectronic Engineering

Volumn 86, Issue 4-6, 2009, Pages 583-585

  Hamouda, F ^a   Barbillon, G ^a   Held, S ^a   Agnus, G ^a   Gogol, P ^a   Maroutian, T ^a   Scheuring, S ^b   Bartenlian, B ^a  

^a CNRS   (France)

^b INSTITUT CURIE   (France)

Author keywords

Lithography; Nanoimprint; PDMS; RIE; UV NIL

Indexed keywords

BIOLOGICAL APPLICATIONS; MEMBRANE PROTEINS; MOLD MATERIALS; NANO-HOLES; NANOIMPRINT; PDMS; POLY(DIMETHYLSILOXANE); RESOLUTION LIMITS; RIE; SILICON SUBSTRATES; SILICON-BASED; UV-NANOIMPRINT LITHOGRAPHIES; UV-NIL; VERY LARGE ARRAYS;

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; MICROCHANNELS; PROTEINS; REACTIVE ION ETCHING; SILICONES;

NANOIMPRINT LITHOGRAPHY;

EID: 67349086427     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.11.086     Document Type: Article

References (6)

1. Gonçalves R.P., Agnus G., Sens P., Houssin C., Bartenlian B., and Scheuring S. Nature Methods 3 (2006) 1007
2. Barbillon G., Bijeon J.-L., Plain J., Lamy de la Chapelle M., Adam P.-M., and Royer P. Surf. Sci. 601 (2007) 5057
3. Plachetka U., Bender M., Fuchs A., Whalbrink T., Glinsner T., and Hurz H. Microelectron. Eng. 83 (2006) 944
4. Bender M., Plachetka U., Ran J., Fuchs A., Vratzov B., Kurz H., and Lindner F. J. Vac. Sci. Technol. B 22 (2004) 3229
5. G. Agnus, T. Arnal, B. Blein, A. Fleurence, F. Gaucher, A. Martinez-Gil, A. Rota, B. Bartenlian, P. Beauvillain, M. Bibes, P. Gogol, A.-M. Haghiri-Gosnet, P. Lecoeur, A. Lesuffleur, T. Maroutian, B. Vilquin, R. Mégy, Recent Research Developments in Applied Physics, in: S.G. Pandalai (Ed.), Transworld Research Network, 2006, p. 71.
6. Maruyama K., Ohkouchi K., Ohtsu Y., and Goto T. Jpn. J. Appl. Phys. 33 (1994) 4298