Plasma etch rate measurements of thin PMMA films and correlation with the glass transition temperature

Journal of Physics: Conference Series

Volumn 10, Issue 1, 2005, Pages 405-408

  Vourdas, N ^a,b   Boudouvis, A G ^b   Gogolides, E ^a  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

^b NATIONAL TECHNICAL UNIVERSITY OF ATHENS   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 22544471849     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/10/1/099     Document Type: Article

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12. Vourdas N, Boudouvis A G and Gogolides E 2005 Microelectron. Eng. in press