Fabrication of Pb(Zr, Ti)O3 microscopic capacitors by electron beam lithography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 8, 1997, Pages 5219-5220

  Hiratani, Masahiko ^a   Okazaki, Choichiro ^a   Hasegawa, Haruhiro ^a   Sugii, Nobuyuki ^a   Tarutani, Yoshinobu ^a   Takagi, Kazumasa ^a  

^a HITACHI LTD   (Japan)

Author keywords

Electron beam lithography; Ferroelectric memory devices; PZT; Size effect; SrRuO3

Indexed keywords

EPITAXIAL MICROSCOPIC CAPACITORS; FERROELECTIC MEMORY DEVICES;

ATOMIC FORCE MICROSCOPY; ELECTRON BEAM LITHOGRAPHY; ETCHING; FERROELECTRIC DEVICES; SEMICONDUCTOR DEVICE MANUFACTURE; SUBSTRATES;

CERAMIC CAPACITORS;

EID: 0031209804     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.5219     Document Type: Article

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