Extended dual-grating alignment method for optical projection lithography

Applied Optics

Volumn 49, Issue 4, 2010, Pages 708-713

  Chen, Wangfu ^a,b   Yan, Wei ^a,b   Hu, Song ^a   Yang, Yong ^a   Zhou, Shaolin ^a,b  

^a INSTITUTE OF OPTICS AND ELECTRONICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

[No Author keywords available]

Indexed keywords

LITHOGRAPHY;

ALIGNMENT METHODS; ANALYTICAL RESULTS; DUAL GRATINGS; OPTICAL PROJECTIONS; PARAMETER DETERMINATION; PHASE VARIATION; PROJECTION LITHOGRAPHY; SUBNANOMETERS;

PHOTOLITHOGRAPHY;

EID: 76649131609     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.49.000708     Document Type: Article

References (13)

1. K. Ronse,P. Jansen, R. Gronheid, E. Hendrickx,M.Maenhoudt, V.Wiaux, A.-M. Goethals, R.Jonckheere,andG.Vandenberghe, "Lithography options for the 32nmhalf pitchnodeandbeyond," IEEE Trans. Circuits Syst. I 56, 1884-1891 (2009).
2. A. J. W. Whang and N. C. Gallagher, "Synthetic approach to designing optical alignment systems," Appl. Opt. 27, 3534-3541 (1988).
3. T. Miyatake, M. Hirose, T. Shoki, R. Ohkubo, and K. Yamazaki, "Nanometer scattered-light alignment system using SiC x-ray masks with low optical transparency," J. Vac. Sci. Technol. B 16, 3471-3475 (1998).
4. D. C. Flanders, H. I. Smith, and S. Austin, "A new interferometric alignment technique," Appl. Phys. Lett. 31, 426-428 (1977).
5. B. Fay, J. Trotel, and A. Frichet, "Optical alignment system for submicron x-ray lithography," J. Vac. Sci. Technol. 16, 1954-1958 (1979).
6. G. Chen, J. P. Wallace, and F. Cerrina, "Linear-Fresnel-zoneplate- based 2-state alignment method for sub-0.25 μm x-raylithography system," Jpn. J. Appl. Phys. Part 1 32, 5977-5981 (1993).
7. J. Itoh, T. Kanayama, N. Atoda, and K. Hoh, "An alignment system for synchrotron radiation x-ray lithography," J. Vac. Sci. Technol. B 6, 409-412 (1988).
8. M. Suzuki and A. Une, "An optical-heterodyne alignment technique for quarter-micron x-ray lithography," J. Vac. Sci. Technol. B 7, 1971-1976 (1989).
9. A. Moel, E. E. Moon, R. D. Frankel, and H. I. Smith, "Novel onaxis interferometric alignment method with sub-10 nm precision," J. Vac. Sci. Technol. B 11, 2191-2194 (1993).
10. E. E. Moon, J. Lee,P.N. Everett, and H. I. Smith, "Application of interferometric broadband imaging alignment on an experimental x-ray stepper," J. Vac. Sci. Technol. B 16, 3631-3636 (1998)
11. N. H. Li, W. Wu, and S. Y. Chou, "Sub-20nm alignment in nanoimprint lithography using Moire fringe," Nano. Lett. 6, 2626-2629 (2006).
12. M. Muhlberger, I. Bergmair, W. Schwinger, M. Gmainer, R. Schoftner, T. Glinsner, Ch. Hasenfub, K. Hingerl, M. Vogler, H. Schmidt, and E. B. Kley, "A Moire method for high accuracy alignment in nanoimprint lithography," Microelectron. Eng. 84, 925-927 (2007).
13. S. L. Zhou, Y. Q. Fu, X. P. Tang, S. Hu,W. F. Chen, and Y. Yang, "Fourier-based analysis of moiré fringe patterns of superposed gratings in alignment of nanolithography," Opt. Express 16, 7869-7880 (2008).