SCOPUS 정보 검색 플랫폼

ECS Transactions

Volumn 25, Issue 8 PART 2, 2009, Pages 865-869

Resistive switching in metal oxide films deposited by metalorganic chemical vapor deposition

(4) Nakamura, Toshihiro a Onogi, Keita a Homma, Kohei a Tachibana, Kunihide a

a KYOTO UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FREQUENCY RESPONSE ANALYSIS; IN-SITU; INFRARED SPECTROSCOPIC; IV CHARACTERISTICS; METAL OXIDE FILM; METALORGANIC CHEMICAL VAPOR DEPOSITION; RESISTANCE CHANGE; RESISTANCE SWITCHING; RESISTIVE SWITCHING;

CALCIUM; FREQUENCY RESPONSE; MANGANESE OXIDE; METALLIC COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SWITCHING SYSTEMS;

OXIDE FILMS;

EID: 76549125689 PISSN: 19385862 EISSN: 19386737 Source Type: Conference Proceeding
DOI: 10.1149/1.3207678 Document Type: Conference Paper

Times cited : (6)

References (14)

1
- 0000748226
- S. Q. Liu, N. J. Wu, and A. Ignatiev, Appl. Phys. Lett., 76, 2749 (2000).
- (2000) Appl. Phys. Lett , vol.76 , pp. 2749
- Liu, S.Q.¹ Wu, N.J.² Ignatiev, A.³

2
- 0042378349
- A. Baikalov, Y. Q. Wang, B. Shen, B. Lorenz, S. Tsui, Y. Y. Sun, Y. Y. Xue, and C. W. Chu, Appl. Phys. Lett., 83, 957 (2003).
- (2003) Appl. Phys. Lett , vol.83 , pp. 957
- Baikalov, A.¹ Wang, Y.Q.² Shen, B.³ Lorenz, B.⁴ Tsui, S.⁵ Sun, Y.Y.⁶ Xue, Y.Y.⁷ Chu, C.W.⁸

3
- 4444237406
- K. Aoyama, K. Waku, A. Asanuma, Y. Uesu, and T. Katsufuji, Appl. Phys. Lett., 85, 1208 (2004).
- (2004) Appl. Phys. Lett , vol.85 , pp. 1208
- Aoyama, K.¹ Waku, K.² Asanuma, A.³ Uesu, Y.⁴ Katsufuji, T.⁵

4
- 10044237971
- A. Sawa, T. Fujii, M. Kawasaki, and Y. Tokura, Appl. Phys. Lett., 85, 4073 (2004).
- (2004) Appl. Phys. Lett , vol.85 , pp. 4073
- Sawa, A.¹ Fujii, T.² Kawasaki, M.³ Tokura, Y.⁴

5
- 84860077655
- A. Odagawa, H. Sato, I. H. Inoue, H. Akoh, M. Kawasaki, Y. Tokura, T. Kanno, and H. Adachi, Phys. Rev. B, 70, 224403 (2004).
- (2004) Phys. Rev. B , vol.70 , pp. 224403
- Odagawa, A.¹ Sato, H.² Inoue, I.H.³ Akoh, H.⁴ Kawasaki, M.⁵ Tokura, Y.⁶ Kanno, T.⁷ Adachi, H.⁸

6
- 19944400157
- C. J. Kim, B. I. Kim, and I.-W. Chen, Jpn. J. Appl. Phys., 44, 1260 (2005).
- (2005) Jpn. J. Appl. Phys , vol.44 , pp. 1260
- Kim, C.J.¹ Kim, B.I.² Chen, I.-W.³

7
- 33751101320
- D. S. Kim, C. E. Lee, Y. H. Kim, and Y. T. Kim, J. Appl. Phys., 100, 093901 (2006).
- (2006) J. Appl. Phys , vol.100 , pp. 093901
- Kim, D.S.¹ Lee, C.E.² Kim, Y.H.³ Kim, Y.T.⁴

8
- 33845724739
- M. Fujimoto, H. Koyama, S. Kobayashi, Y. Tamai, N. Awaya, Y. Nishi, and T. Suzuki, Appl. Phys. Lett., 89, 243504 (2006).
- (2006) Appl. Phys. Lett , vol.89 , pp. 243504
- Fujimoto, M.¹ Koyama, H.² Kobayashi, S.³ Tamai, Y.⁴ Awaya, N.⁵ Nishi, Y.⁶ Suzuki, T.⁷

9
- 33847703293
- S. T. Hsu, T. Li, and N. Awaya, J. Appl. Phys., 101, 024517 (2007).
- (2007) J. Appl. Phys , vol.101 , pp. 024517
- Hsu, S.T.¹ Li, T.² Awaya, N.³

10
- 34249004723
- T. Nakamura, K. Homma, R. Tai, A. Nishio, and K. Tachibana, IEEE Trans. Magn., 43, 3070(2007).
- (2007) IEEE Trans. Magn , vol.43 , pp. 3070
- Nakamura, T.¹ Homma, K.² Tai, R.³ Nishio, A.⁴ Tachibana, K.⁵

11
- 34547663752
- T. Nakamura, K. Homma, T. Yakushiji, R. Tai, A. Nishio, and K. Tachibana, Surf. Coat Technol., 201, 9275 (2007).
- (2007) Surf. Coat Technol , vol.201 , pp. 9275
- Nakamura, T.¹ Homma, K.² Yakushiji, T.³ Tai, R.⁴ Nishio, A.⁵ Tachibana, K.⁶

12
- 20944437733
- 10H712 2005
- T. Nakamura, T. Nishimura, R. Tai, and K. Tachibana, J. Appl. Phys. 97, 10H712 (2005).
- J. Appl. Phys , vol.97
- Nakamura, T.¹ Nishimura, T.² Tai, R.³ Tachibana, K.⁴

13
- 25644460359
- T. Nakamura, R. Tai, T. Nishimura, and K. Tachibana, J. Electrochem. Soc. 152, C584 (2005).
- (2005) J. Electrochem. Soc , vol.152
- Nakamura, T.¹ Tai, R.² Nishimura, T.³ Tachibana, K.⁴

14
- 33646735775
- 08Q302 2006
- T. Nakamura, R. Tai, and K. Tachibana, J. Appl. Phys. 99, 08Q302 (2006).
- J. Appl. Phys , vol.99
- Nakamura, T.¹ Tai, R.² Tachibana, K.³

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.