Ultrafast electrodeposition of amorphous carbon nitride films from fullerene derivative

Electrochemistry Communications

Volumn 12, Issue 3, 2010, Pages 390-393

  Yu, Yuanlie ^a   Zhang, Junyan ^a  

^a LANZHOU INSTITUTE OF CHEMICAL PHYSICS   (China)

Author keywords

C60 (NH2)2CNCN 5 derivative; Photoluminescence; Thin films; Ultrafast deposition

Indexed keywords

AMORPHOUS CARBON NITRIDE FILMS; C60[(NH2)2CNCN]5 DERIVATIVE; CONCENTRATION OF; DEPOSITION TIME; DOUBLE BONDS; ELECTROCHEMICAL DECOMPOSITION; FULLERENE DERIVATIVE; LIQUID PHASE; OPTICAL TEST; THICKNESS OF THE FILM; TRIPLE BONDS; ULTRA-FAST; ULTRAFAST DEPOSITION;

AMORPHOUS CARBON; CARBON FILMS; CARBON NITRIDE; CHEMICAL VAPOR DEPOSITION; DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FULLERENES; OPTICAL TESTING; PHOTOLUMINESCENCE; RAMAN SPECTROSCOPY; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS FILMS;

EID: 76449112193     PISSN: 13882481     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elecom.2010.01.001     Document Type: Article

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