Fabrication of highly conductive Ru/a-CNx:H composite films by anode deposit

Electrochemistry Communications

Volumn 11, Issue 4, 2009, Pages 772-775

  Yu, Yuanlie ^a,b   Zhang, Bin ^a,b   Zhang, Junyan ^a  

^a LANZHOU INSTITUTE OF CHEMICAL PHYSICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

Anode deposit; Conductivity; Ru a CNx:H composite films

Indexed keywords

ACETONITRILE; AMORPHOUS CARBON; CARBON FILMS; DOPING (ADDITIVES); ELECTRODEPOSITION; NITRIDES; REDUCTION; RUTHENIUM; SILICON WAFERS; SINGLE CRYSTALS;

AMORPHOUS CARBON MATRIXES; ATOMIC RATIOS; CARBON SOURCES; CONDUCTIVITY; ELECTRO-CHEMICAL DEPOSITIONS; HYDROGENATED AMORPHOUS CARBON NITRIDES; NANO-CRYSTALLINE PARTICLES; RU/A-CNX:H COMPOSITE FILMS; SI(1 0 0 ); SINGLE CRYSTAL SILICONS;

COMPOSITE FILMS;

EID: 62849103051     PISSN: 13882481     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elecom.2009.01.031     Document Type: Article

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