Growth kinetics of disk-shaped copper islands in electrochemical deposition

Physical Review E - Statistical, Nonlinear, and Soft Matter Physics

Volumn 79, Issue 5, 2009, Pages

  Guo, Lian ^a   Zhang, Shouliang ^b   Searson, Peter ^a  

^a Johns Hopkins University   (United States)

^b JOHNS HOPKINS UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SUBSTRATE; ANION ADSORPTION; BASAL PLANES; ELECTROCHEMICAL DEPOSITION; ELECTROCRYSTALLIZATION; GROWTH EXPONENT; GROWTH MECHANISMS; ISLAND GROWTH; LATERAL GROWTH; OVERPOTENTIAL; POWER-LAW KINETICS; RUTHENIUM OXIDE; SURFACE NORMALS; TWO-DIMENSIONAL NUCLEATION; VERTICAL DIRECTION; VERTICAL GROWTH;

ADATOMS; ADSORPTION; COPPER OXIDES; CRYSTAL GROWTH; CRYSTAL ORIENTATION; DISKS (STRUCTURAL COMPONENTS); ELECTRODEPOSITION; NUCLEATION; REDUCTION; RUTHENIUM; RUTHENIUM COMPOUNDS; SOIL CONSERVATION; SUBSTRATES; SURFACE DIFFUSION; TWO DIMENSIONAL;

GROWTH KINETICS;

EID: 66549113660     PISSN: 15393755     EISSN: 15502376     Source Type: Journal    
DOI: 10.1103/PhysRevE.79.051601     Document Type: Article

References (53)

1. E. Budevski, G. Staikov, and W. J. Lorenz, Electrochemical Phase Formation and Growth: An Introduction to the Initial Stages of Metal Deposition (VCH, Weinheim, 1996).
2. E. Budevski, G. Staikov, and W. J. Lorenz, Electrochim. Acta 45, 2559 (2000). 10.1016/S0013-4686(00)00353-4
3. E. Budevski, V. Bostanov, and G. Staikov, Annu. Rev. Mater. Sci. 10, 85 (1980). 10.1146/annurev.ms.10.080180.000505
4. A. Milchev, Electrocrystallization: Fundamentals of Nucleation and Growth (Kluwer, Boston, MA, 2002).
5. D. Kashchiev, Nucleation: Basic Theory with Applications (Butterworth-Heinemann, Oxford, 2000).
6. G. Oskam, P. M. Vereecken, and P. C. Searson, J. Electrochem. Soc. 146, 1436 (1999). 10.1149/1.1391782
7. G. Oskam and P. C. Searson, Surf. Sci. 446, 103 (2000). 10.1016/S0039-6028(99)01113-9
8. A. Radisic, F. M. Ross, and P. C. Searson, J. Phys. Chem. B 110, 7862 (2006). 10.1021/jp057549a
9. A. Radisic, Nano Lett. 6, 238 (2006). 10.1021/nl052175i
10. A. Radisic, Surf. Sci. 600, 1817 (2006). 10.1016/j.susc.2006.02.025
11. A. Radisic, A. C. West, and P. C. Searson, J. Electrochem. Soc. 149, C94 (2002). 10.1149/1.1430719
12. E. C. Walter, J. Phys. Chem. B 106, 11407 (2002). 10.1021/jp026389p
13. E. J. Menke, Nature Mater. 5, 914 (2006). 10.1038/nmat1759
14. R. M. Penner, J. Phys. Chem. B 105, 8672 (2001). 10.1021/jp0112828
15. M. Giesen and S. Baier, J. Phys.: Condens. Matter 13, 5009 (2001). 10.1088/0953-8984/13/21/325
16. Q. Wu and D. Barkey, J. Electrochem. Soc. 144, L261 (1997). 10.1149/1.1837938
17. E. Budevski, G. Staikov, and V. Bostanov, J. Cryst. Growth 29, 316 (1975). 10.1016/0022-0248(75)90178-5
18. H. E. Buckley, Crystal Growth (Wiley, New York, 1951).
19. J. W. Mullin, Crystallization (Butterworth-Heinemann, Oxford, 2001).
20. W. K. Burton, N. Cabrera, and F. C. Frank, Philos. Trans. R. Soc. London, Ser. A 243, 299 (1951). 10.1098/rsta.1951.0006
21. T. Sugimoto, Adv. Colloid Interface Sci. 28, 65 (1987). 10.1016/0001-8686(87)80009-X
22. C. A. Orme, Nature (London) 411, 775 (2001). 10.1038/35081034
23. P. D. Ward, Science 308, 1566 (2005). 10.1126/science.1111099
24. C. Burda, Chem. Rev. (Washington, D.C.) 105, 1025 (2005). 10.1021/cr030063a
25. R. Narayanan and M. A. El-Sayed, Nano Lett. 4, 1343 (2004). 10.1021/nl0495256
26. M. A. El-Sayed, Acc. Chem. Res. 37, 326 (2004). 10.1021/ar020204f
27. V. F. Puntes, K. M. Krishnan, and A. P. Alivisatos, Science 291, 2115 (2001). 10.1126/science.1057553
28. C. J. Murphy, J. Phys. Chem. B 109, 13857 (2005). 10.1021/jp0516846
29. C. J. Murphy, Inorg. Chem. 45, 7544 (2006). 10.1021/ic0519382
30. H. Yu, J. Am. Chem. Soc. 125, 16168 (2003). 10.1021/ja037971+
31. Z. A. Peng and X. G. Peng, J. Am. Chem. Soc. 123, 1389 (2001). 10.1021/ja0027766
32. L. Guo, A. Radisic, and P. C. Searson, J. Electrochem. Soc. 153, C840 (2006). 10.1149/1.2354454
33. D. R. Lide, CRC Handbook of Chemistry and Physics: A Ready-Reference Book of Chemical and Physical Data (CRC, Boca Raton, FL, 1992).
34. S. Thurgate and K. Wandelt, Solid-Liquid Interfaces Macroscopic Phenomena, Microscopic Understanding (Springer, Berlin, 2003).
35. P. Broekmann, J. Electroanal. Chem. 467, 307 (1999). 10.1016/S0022- 0728(99)00048-0
36. M. Avrami, J. Chem. Phys. 7, 1103 (1939). 10.1063/1.1750380
37. M. Avrami, J. Chem. Phys. 8, 212 (1940). 10.1063/1.1750631
38. M. Avrami, J. Chem. Phys. 9, 177 (1941). 10.1063/1.1750872
39. C. Donner, Z. Phys. Chem. 220, 265 (2006).
40. L. Ratke and P. W. Voorhees, Growth and Coarsening: Ostwald Ripening in Material Processing, Zeitschrift Fur Physikalische Chemie-International Journal of Research in Physical Chemistry & Chemical Physics (Springer, Berlin, 2002).
41. M. Giesen, Electrochim. Acta 45, 527 (1999). 10.1016/S0013-4686(99)00231- 5
42. D. M. Kolb, R. Ullmann, and J. C. Ziegler, Electrochim. Acta 43, 2751 (1998). 10.1016/S0013-4686(98)00016-4
43. S. Morin, Phys. Rev. Lett. 83, 5066 (1999). 10.1103/PhysRevLett.83.5066
44. A. Radisic, J. Electrochem. Soc. 148, C41 (2001). 10.1149/1.1344539
45. L. Guo and P. C. Searson, Langmuir 24, 10557 (2008). 10.1021/la801707m
46. R. Liu, Chem. Mater. 13, 508 (2001). 10.1021/cm000763l
47. G. Oskam, J. Phys. D 31, 1927 (1998). 10.1088/0022-3727/31/16/001
48. M. B. Vukmirovic, R. L. Sabatini, and R. R. Adzic, Surf. Sci. 572, 269 (2004). 10.1016/j.susc.2004.09.001
49. A. Radisic, J. Electrochem. Soc. 150, C362 (2003). 10.1149/1.1565137
50. H. C. Koo, J. Electrochem. Soc. 155, D389 (2008). 10.1149/1.2890394
51. K. Krug, J. Stettner, and O. M. Magnussen, Phys. Rev. Lett. 96, 246101 (2006). 10.1103/PhysRevLett.96.246101
52. M. Giesen, Surf. Sci. 595, 127 (2005). 10.1016/j.susc.2005.07.040
53. O. M. Magnussen, Chem. Rev. (Washington, D.C.) 102, 679 (2002). 10.1021/cr000069p