Nanocrystalline silicon thin films prepared by RF sputtering at low temperature and heterojunction solar cell

Materials Letters

Volumn 58, Issue 30, 2004, Pages 3963-3966

  Zhao, Z X ^a,b   Cui, R Q ^a   Meng, F Y ^a   Zhao, B C ^a   Yu, H C ^a   Zhou, Z B ^a  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

^b SHANGHAI UNIVERSITY   (China)

Author keywords

Heterojunction solar cell; Low temperature growth; Nanometer silicon

Indexed keywords

ATOMIC FORCE MICROSCOPY; HETEROJUNCTIONS; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING SILICON; SPUTTERING; THERMAL EFFECTS; VACUUM; X RAY DIFFRACTION ANALYSIS;

HETEROJUNCTION SOLAR CELLS; LOW TEMPERATURE GROWTH; NANOMETER SILICONS;

THIN FILMS;

EID: 7644243612     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2004.09.004     Document Type: Article

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