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Volumn 204, Issue 14, 2010, Pages 2187-2192
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Preparation of mesoporous silica thin films on polystyrene substrate by electrochemically induced sol-gel technique
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Author keywords
Electrochemically induced sol gel technique; Mesoporous silica film; Polystyrene; Structure directing agent
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Indexed keywords
ATTENUATED TOTAL REFLECTANCE;
CETYLTRIMETHYLAMMONIUM BROMIDE;
COATING DEPOSITION;
CRACK FREE;
CRACK-FREE LAYERS;
DEPOSITION TIME;
DEPOSITION VOLTAGE;
ENERGY DISPERSIVE X RAY SPECTROSCOPY;
FOURIER TRANSFORM INFRARED;
FT-IR-ATR;
HEXAGONAL MESOSTRUCTURE;
MESOPOROUS SILICA FILM;
MESOPOROUS SILICA THIN FILMS;
OPTIMUM CONDITIONS;
PORE ARRAYS;
PORE DIAMETERS;
SEM;
SILICA FILM;
SILICA SOURCES;
SMALL ANGLE X-RAY DIFFRACTIONS;
SOL-GEL TECHNIQUE;
STRUCTURE DIRECTING AGENTS;
SYNTHESIS PARAMETERS;
TEM;
TETRAETHOXYORTHOSILICATE;
AMMONIUM COMPOUNDS;
CHEMICAL VAPOR DEPOSITION;
CRACKS;
GELS;
INFRARED SPECTROSCOPY;
MESOPOROUS MATERIALS;
POLYSTYRENES;
SCANNING ELECTRON MICROSCOPY;
SILICA;
SOL-GEL PROCESS;
SOL-GELS;
SOLS;
SUBSTRATES;
SULFURIC ACID;
SYNTHESIS (CHEMICAL);
THIN FILMS;
TRANSMISSION ELECTRON MICROSCOPY;
X RAY SPECTROSCOPY;
FILM PREPARATION;
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EID: 76349087825
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2009.12.003 Document Type: Article |
Times cited : (19)
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References (32)
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