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Volumn 204, Issue 14, 2010, Pages 2187-2192

Preparation of mesoporous silica thin films on polystyrene substrate by electrochemically induced sol-gel technique

Author keywords

Electrochemically induced sol gel technique; Mesoporous silica film; Polystyrene; Structure directing agent

Indexed keywords

ATTENUATED TOTAL REFLECTANCE; CETYLTRIMETHYLAMMONIUM BROMIDE; COATING DEPOSITION; CRACK FREE; CRACK-FREE LAYERS; DEPOSITION TIME; DEPOSITION VOLTAGE; ENERGY DISPERSIVE X RAY SPECTROSCOPY; FOURIER TRANSFORM INFRARED; FT-IR-ATR; HEXAGONAL MESOSTRUCTURE; MESOPOROUS SILICA FILM; MESOPOROUS SILICA THIN FILMS; OPTIMUM CONDITIONS; PORE ARRAYS; PORE DIAMETERS; SEM; SILICA FILM; SILICA SOURCES; SMALL ANGLE X-RAY DIFFRACTIONS; SOL-GEL TECHNIQUE; STRUCTURE DIRECTING AGENTS; SYNTHESIS PARAMETERS; TEM; TETRAETHOXYORTHOSILICATE;

EID: 76349087825     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.12.003     Document Type: Article
Times cited : (19)

References (32)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.