Optical and mechanical characterization of ultrananocrystalline diamond films prepared in dual frequency discharges

Surface and Coatings Technology

Volumn 204, Issue 12-13, 2010, Pages 1997-2001

  Karásková, Monika ^a   Zajíčková, Lenka ^a   Buršíková, Vilma ^a   Franta, Daniel ^a   Nečas, David ^a   Bláhová, Olga ^b   Šperka, Jiří ^a  

^a MASARYK UNIVERSITY   (Czech Republic)

^b UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

Author keywords

Bias enhanced nucleation; Ellipsometry; FTIR; Indentation hardness; Ultrananocrystalline diamond

Indexed keywords

BIAS ENHANCED NUCLEATION; DEPOSITION PROCESS; DEPOSITION TEMPERATURES; DIAMOND LIKE CARBON; DUAL FREQUENCY; FTIR; GROWING FILMS; HYDROGEN DISCHARGE; INDENTATION HARDNESS; INTERMEDIATE LAYERS; MECHANICAL CHARACTERIZATIONS; MICROWAVE DISCHARGE; OPTICAL MEASUREMENT; RF DISCHARGE; RF POWER; SELF-BIAS; SIC MATERIALS; SILICON SUBSTRATES; SUBSTRATE ELECTRODES; TOTAL PRESSURE; ULTRA-NANOCRYSTALLINE DIAMOND; ULTRANANOCRYSTALLINE DIAMOND FILMS; ULTRANANOCRYSTALLINE DIAMONDS;

DIAMOND FILMS; DIAMONDS; ELLIPSOMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FRACTURE TOUGHNESS; HARDNESS; METHANE; MICROWAVES; NUCLEATION; OPTICAL DATA PROCESSING; SILICON CARBIDE; SUBSTRATES; WAVEGUIDES;

ELECTRIC DISCHARGES;

EID: 76349084496     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.09.017     Document Type: Article

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