Two- and three-dimensional ultrananocrystalline diamond (UNCD) structures for a high resolution diamond-based MEMS technology

Materials Research Society Symposium - Proceedings

Volumn 605, Issue , 2000, Pages 73-78

  Auciello, O ^a   Krauss, A R ^a   Gruen, D M ^a   Meyer, E M ^b   Busmann, H G ^c   Tucek, J ^a   Sumant, A ^a   Jayatissa, A ^a   Moldovan, N ^a   Mancini, D C ^a   Gardos, M N ^d  

^a ARGONNE NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF BREMEN   (Germany)

^c FRAUNHOFER INSTITUTE FOR MANUFACTURING TECHNOLOGY AND ADVANCED MATERIALS IFAM   (Germany)

^d RAYTHEON COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COATINGS; DIAMOND FILMS; FRICTION; MICROELECTROMECHANICAL DEVICES; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE; THERMODYNAMIC PROPERTIES; TRIBOLOGY; WEAR OF MATERIALS;

LITHOGRAPHIC PATTERNING METHOD; TWO DIMENSIONAL ULTRANANOCRYSTALLINE DIAMOND;

SEMICONDUCTING DIAMONDS;

EID: 0034499633     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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