Optical characterization of ultrananocrystalline diamond films

Diamond and Related Materials

Volumn 17, Issue 7-10, 2008, Pages 1278-1282

  Franta, Daniel ^a   Zajíčková, Lenka ^a   Karásková, Monika ^a   Jašek, Ondřej ^a   Nečas, David ^a   Klapetek, Petr ^b   Valtr, Miroslav ^b  

^a MASARYK UNIVERSITY   (Czech Republic)

^b CZECH METROLOGY INSTITUTE   (Czech Republic)

Author keywords

Band structure; Nanocrystalline carbon; Optical properties characterization

Indexed keywords

AMORPHOUS CARBON; AMORPHOUS MATERIALS; AMORPHOUS SILICON; CARBON FILMS; DIAMOND CUTTING TOOLS; DIAMONDS; ELECTRIC DISCHARGES; EPITAXIAL GROWTH; FILM GROWTH; LITHOGRAPHY; MOLECULAR BEAM EPITAXY; NANOCRYSTALLINE MATERIALS; NANOSTRUCTURED MATERIALS; NONMETALS; OPTICAL PROPERTIES; PHOTORESISTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; REFRACTIVE INDEX; SEMICONDUCTING CADMIUM TELLURIDE; SILICON; SILICON CARBIDE; SPECTROSCOPIC ELLIPSOMETRY; SUBSTRATES; SURFACE ROUGHNESS;

AMORPHOUS HYDROGENATED CARBON; BAND STRUCTURE; DUAL-FREQUENCY; MICROWAVE CAVITIES; NANOCRYSTALLINE CARBON; NUCLEATION LAYER; OPTICAL CHARACTERIZATIONS; OPTICAL MODELLING; OPTICAL PROPERTIES CHARACTERIZATION; POLY-CRYSTALLINE DIAMOND; RADIO FREQUENCY PLASMAS; RAYLEIGH-RICE THEORY; REFRACTIVE INDEX PROFILING; SELF BIASING; SILICON SUBSTRATES; SPECTROSCOPIC REFLECTOMETRY; ULTRANANOCRYSTALLINE DIAMOND FILMS; VARIABLE-ANGLE SPECTROSCOPIC ELLIPSOMETRY;

DIAMOND FILMS;

EID: 48849107351     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2008.01.109     Document Type: Article

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