Multiple nanoscale templates by orthogonal degradation of a supramolecular block copolymer lithographic system

ACS Nano

Volumn 4, Issue 1, 2010, Pages 285-291

  Tang, Chuanbing ^a   Sivanandan, Kulandaivelu ^a   Stahl, Brian C ^a,b   Fredrickson, Glenn H ^a,b   Kramer, Edward J ^a,b   Hawker, Craig J ^a,b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b University of California   (United States)

Author keywords

Block copolymer lithography; Supramolecular assembly; Templates; Thin films

Indexed keywords

ARRAY PATTERNS; BLOCK COPOLYMER LITHOGRAPHY; BOND ACCEPTORS; DEGRADATION CHEMISTRY; DIFFERENT PORE SIZES; DONOR GROUPS; LITHOGRAPHIC SYSTEMS; NANO SCALE; NANOPOROUS THIN FILMS; ROBUST STRATEGY; SUPRAMOLECULAR ASSEMBLIES; SUPRAMOLECULAR ASSEMBLY; SUPRAMOLECULAR SYSTEMS; TUNABILITIES;

BLENDING; BLOCK COPOLYMERS; DEGRADATION; MESOPOROUS MATERIALS; NANOSTRUCTURED MATERIALS; PLASTIC PRODUCTS; SUPRAMOLECULAR CHEMISTRY; THIN FILMS;

COPOLYMERIZATION;

NANOMATERIAL; POLYMER; SOLVENT;

ARTICLE; CHEMISTRY; HYDROGEN BOND; PHOTOLYSIS; POROSITY; SYNTHESIS;

HYDROGEN BONDING; NANOSTRUCTURES; PHOTOLYSIS; POLYMERS; POROSITY; SOLVENTS;

EID: 75749097358     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn901330q     Document Type: Article

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