Tribological behavior of plasma-enhanced CVD a-C:H films. Part I: Effect of processing parameters

Tribology International

Volumn 37, Issue 11-12 SPEC.ISS., 2004, Pages 1019-1029

  Gupta, P ^a   Singh, V ^a   Meletis, E I ^a  

^a Louisiana State University   (United States)

Author keywords

Amorphous hydrogenated carbon; Plasma enhanced CVD; Tribology; X ray photoelectron spectroscopy

Indexed keywords

AMORPHOUS FILMS; BIOCOMPATIBILITY; CARBON; CHEMICAL VAPOR DEPOSITION; MAGNETRON SPUTTERING; THERMAL CONDUCTIVITY; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS HYDROGENATED CARBON; HYDROCARBON PRECURSOR; MULTINANOLAYERED FILMS; NUCLEAR REACTION ANALYSIS (NRA);

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 7544251380     PISSN: 0301679X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.triboint.2004.07.020     Document Type: Article

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