Dry fabrication process for heterojunction solar cells through in-situ plasma cleaning and passivation

Solar Energy Materials and Solar Cells

Volumn 94, Issue 3, 2010, Pages 402-405

  Moreno, M ^a   Labrune, M ^a,b   Roca i Cabarrocas, P ^a  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

^b TOTAL   (France)

Author keywords

Ellipsometry; Heterojunction solar cells; Plasma cleaning

Indexed keywords

A-SI:H; EFFECTIVE LIFETIME; EFFICIENT SURFACE; FABRICATION PROCESS; HETEROJUNCTION SOLAR CELLS; IN-SITU; IN-SITU ELLIPSOMETRY; LOW TEMPERATURE PLASMAS; NATIVE OXIDES; OPTIMIZED PROCESS; PLASMA CLEANING; PLASMA TREATMENT; PROCESS CONDITION; RF-PECVD; SI SURFACES; SI WAFER; SURFACE RECOMBINATION VELOCITIES; SURFACE RECOMBINATIONS;

CHEMICAL VAPOR DEPOSITION; ELLIPSOMETRY; HETEROJUNCTIONS; OPEN CIRCUIT VOLTAGE; PASSIVATION; PLASMA DEPOSITION; PLASMAS; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SILICON WAFERS; SOLAR CELLS;

SURFACE CLEANING;

EID: 75149131538     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2009.10.016     Document Type: Article

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