Nanoscratch study of hard HfB2 thin films using experimental and finite element techniques

Wear

Volumn 268, Issue 5-6, 2010, Pages 677-685

  Chatterjee, Abhishek ^a   Polycarpou, Andreas A ^b   Abelson, John R ^a   Bellon, Pascal ^a  

^a University of Illinois at Urbana Champaign   (United States)

^b UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

Finite element analysis; Material properties; Nanoindentation; Nanoscratch; Residual stresses; Thin solid film

Indexed keywords

FINITE ELEMENT ANALYSIS; MATERIAL PROPERTIES; MATERIAL PROPERTY; NANO-SCRATCH; THIN SOLID FILM;

ANNEALING; CURVE FITTING; MATERIALS PROPERTIES; NANOTECHNOLOGY; POISSON RATIO; RESIDUAL STRESSES; TENSILE STRESS; THIN FILMS;

FINITE ELEMENT METHOD;

EID: 74649085896     PISSN: 00431648     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.wear.2009.11.001     Document Type: Article

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