Increase and decrease of etching rate of silicon due to diamond tip sliding by changing scanning density

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 41, Issue 10 A, 2002, Pages

  Miyake, Shojiro ^a   Kim, Jongduk ^a  

^a NIPPON INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Atomic force microscope; Local oxidation; Mechanochemical processing; Microprocessing; Natural oxide layer; Protective etching mask

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIAMONDS; ETCHING; SCANNING;

DIAMOND TIP SLIDING;

SILICON;

EID: 0036814765     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.l1116     Document Type: Article

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