Novel "In-situ2" approach to modified ALD processes for nano-functional metal-oxide films

ECS Transactions

Volumn 25, Issue 4, 2009, Pages 253-261

  Tallarida, M ^a   Karavaev, K ^a   Schmeisser, D ^a  

^a BRANDENBURG UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; METALLIC COMPOUNDS; METALS; RADIATION EFFECTS; SYNCHROTRON RADIATION; THIN FILMS;

BASIC CHARACTERISTICS; CHEMICAL-PHYSICAL PROPERTIES; EXPERIMENTAL TECHNIQUES; FUNCTIONAL METALS; IN-SITU INVESTIGATIONS; METAL OXIDE FILM; METAL OXIDE THIN FILMS; SURFACE SENSITIVITY;

OXIDE FILMS;

EID: 74249114113     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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