Kinetic investigation of the electrochemical synthesis of vertically-aligned periodic arrays of silicon nanorods on (001)Si substrate

Thin Solid Films

Volumn 518, Issue 6 SUPPL. 1, 2010, Pages

  Cheng, S L ^a   Chen, C Y ^a   Lee, S W ^a  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

Author keywords

Formation kinetics; Hydrophobicity; Nanosphere lithography; Reactive ion etching; Silicon nanorods

Indexed keywords

AXIAL ORIENTATIONS; CASSIE-BAXTER MODEL; CHEMICAL-ETCHING PROCESS; CRYSTALLOGRAPHIC ORIENTATIONS; ELECTROCHEMICAL SYNTHESIS; ETCHING SOLUTIONS; ETCHING TEMPERATURE; FORMATION KINETICS; KINETIC INVESTIGATIONS; NANO SPHERE LITHOGRAPHY; NANOROD ARRAYS; NANORODS ARRAYS; PERIODIC ARRAYS; SI SUBSTRATES; SI WAFER; SUBMICROMETERS; WATER CONTACT ANGLE MEASUREMENT;

ACTIVATION ENERGY; ANGLE MEASUREMENT; ARRHENIUS PLOTS; CONTACT ANGLE; CRYSTAL ORIENTATION; HYDROPHOBICITY; MICROMETERS; NANORODS; NANOSPHERES; REACTIVE ION ETCHING; SILICON; SILICON WAFERS; SINGLE CRYSTALS; SUBSTRATES; SYNTHESIS (CHEMICAL);

SEMICONDUCTING SILICON COMPOUNDS;

EID: 74049142069     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.10.086     Document Type: Article

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