High-resolution analytical electron microscopy of catalytically etched silicon nanowires

Applied Physics A: Materials Science and Processing

Volumn 95, Issue 2, 2009, Pages 325-327

  Schade, M ^a   Geyer, N ^a   Fuhrmann, B ^a   Heyroth, F ^a   Leipner, H S ^a  

^a MARTIN LUTHER UNIVERSITY HALLE WITTENBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CRYSTALLINE MATERIALS; ELECTRIC WIRE; ELECTRON MICROSCOPES; HIGH RESOLUTION ELECTRON MICROSCOPY; NANOWIRES; PLASMA ETCHING; POROUS SILICON; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY;

ANALYTICAL ELECTRON MICROSCOPIES; ANALYTICAL TRANSMISSION ELECTRON MICROSCOPIES; COLLOIDAL LITHOGRAPHIES; CRYSTALLINE SILICONS; HIGH RESOLUTIONS; INTERNAL STRUCTURES; POROUS STRUCTURES; SCANNING TRANSMISSION ELECTRON MICROSCOPIES; SILICON NANOWIRES; SINGLE-CRYSTALLINE; SUB-50 NM; VERTICALLY ALIGNED;

AMORPHOUS SILICON;

EID: 62349092572     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-009-5101-x     Document Type: Article

References (8)

1. R.S. Wagner W.C. Ellis 1964 Appl. Phys. Lett. 4 89
2. B. Fuhrmann H.S. Leipner H.-R. Höche L. Schubert U. Gösele 2005 Nano. Lett. 5 2524
3. Z. Huang H. Fang J. Zhu 2007 Adv. Mater. 19 744
4. K. Peng J. Hu Y. Yan Y. Wu H. Fang Y. Xu S.T. Lees J. Zhu 2006 Adv. Funct. Mater. 16 387
5. X. Li W. Bohn 2000 Appl. Phys. Lett. 77 2572
6. H. Föll M. Christophersen J. Carstensen G. Hasse 1981 Mater. Sci. Eng. R 39 93
7. R. Leapman, Transmission Electron Energy Loss Spectroscopy in Materials Science and the EELS Atlas (Wiley, Weinheim, 2004), pp. 70-75
8. L. Dori J. Bruley D.J. DiMaria P.E. Batson J. Tornello M. Arienzo 1991 J. Appl. Phys. 69 4 2317