Spatial light modulator for maskless optical projection lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 6, 2006, Pages 2852-2856

  Watson, G P ^a   Aksyuk, V ^a   Simon, M E ^a   Tennant, D M ^a   Cirelli, R A ^a   Mansfield, W M ^a   Pardo, F ^a   Lopez, D O ^a   Bolle, C A ^a   Papazian, A R ^a   Basavanhally, N ^a   Lee, J ^a   Fullowan, R ^a   Klemens, F ^a   Miner, J ^a   Kornblit, A ^a   Sorsch, T ^a   Fetter, L ^a   Peabody, M ^a   Bower, J E ^a   Weiner, J S ^a   Low, Y L ^a   more..

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; LIGHT MODULATION; MASKS; MICROELECTROMECHANICAL DEVICES; POLYCRYSTALLINE MATERIALS; PROFILOMETRY; SILICON COMPOUNDS;

AERIAL IMAGE SIMULATIONS; MASKLESS OPTICAL PROJECTION LITHOGRAPHY; PHOTOMASKS; WAVELENGTH SCANNERS;

PHOTOLITHOGRAPHY;

EID: 33845269971     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2387156     Document Type: Article

References (7)

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