On the structure and surface chemical composition of indium-tin oxide films prepared by long-throw magnetron sputtering

Thin Solid Films

Volumn 518, Issue 8, 2010, Pages 2290-2294

  Chuang, M J ^a   Huang, H F ^b   Wen, C H ^b   Chu, A K ^c  

^a CHIENKUO TECHNOLOGY UNIVERSITY   (Taiwan)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^c NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

Author keywords

ITO; rf magnetron sputtering; X ray diffraction; X ray photoelectron spectroscopy

Indexed keywords

ARGON SPUTTERING; COMPOSITION ANALYSIS; ENERGETIC PARTICLES; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; FILM SURFACES; GLASS SUBSTRATES; GRAIN SIZE; HIGH CONCENTRATION; HYDROLYSIS REACTION; INDIUM OXIDE; INDIUM TIN OXIDE; INDIUM TIN OXIDE THIN FILMS; ITO FILMS; LOW SUBSTRATE TEMPERATURE; OXYGEN ATOM; PEAK AREA; POLYCRYSTALLINE; RADIO-FREQUENCY-MAGNETRON SPUTTERING; RF-MAGNETRON SPUTTERING; STRUCTURE EVOLUTION; SUBGRAIN BOUNDARIES; SUBSTRATE DISTANCE; SUBSTRATE TEMPERATURE; SURFACE CHEMICAL COMPOSITION; SURFACE COMPOSITIONS; XPS; XPS SPECTRA;

AMORPHOUS FILMS; ARGON; ATOMIC SPECTROSCOPY; DIFFRACTION; ELECTRONS; FILM PREPARATION; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; INDIUM; INDIUM COMPOUNDS; ITO GLASS; MAGNETRON SPUTTERING; MAGNETRONS; OXIDE FILMS; OXYGEN; PHOTOELECTRICITY; PHOTOIONIZATION; PHOTONS; SCANNING ELECTRON MICROSCOPY; STRUCTURE (COMPOSITION); SUBSTRATES; SURFACE STRUCTURE; TIN; TITANIUM COMPOUNDS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; X RAYS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 73949107767     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.10.146     Document Type: Article

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