MOCVD and ALD of CeO2 thin films using a novel monomeric Ce IV alkoxide precursor

Chemical Vapor Deposition

Volumn 15, Issue 10-12, 2009, Pages 259-261

  Wrench, Jacqueline S ^a   Black, Kate ^a   Aspinall, Helen C ^a   Jones, Anthony C ^a   Bacsa, John ^a   Chalker, Paul R ^a   King, Peter J ^a   Werner, Matthew ^a   Davies, Hywel O ^b   Heys, Peter N ^b  

^a UNIVERSITY OF LIVERPOOL   (United Kingdom)

^b SAFC Hitech   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ALKOXIDE PRECURSOR; ALKOXIDES; CARBON LEVEL; DETECTION LIMITS; HIGH PURITY; HOMOLEPTIC; MOCVD; REACTION MIXTURE; ROOM TEMPERATURE;

AUGER ELECTRON SPECTROSCOPY; CARBON FILMS; CERIUM COMPOUNDS; CHEMICAL VAPOR DEPOSITION; HEXANE; SYNTHETIC FUELS;

CERIUM;

EID: 73849090177     PISSN: 09481907     EISSN: 15213862     Source Type: Journal    
DOI: 10.1002/cvde.200904279     Document Type: Article

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